SCHEMBL6853365

SCHEMBL6853365

Nc1cc(Oc2c(F)c(F)c(C(=O)c3c(F)c(F)c(Oc4ccc(O)c(N)c4)c(F)c3F)c(F)c2F)ccc1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.44
THRB P10828 3/20 0.44
SMN1; SMN2 Q16637 3/20 0.44
GAA P10253 3/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
ALDH1A1 P00352 2/20 0.44
KDM4E B2RXH2 2/20 0.44
RECQL P46063 1/20 0.44
BLM P54132 1/20 0.44
MCL1 Q07820 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
POLB P06746 2/20 0.41
HSP90AA1 P07900 1/20 0.41
HSD17B10 Q99714 2/20 0.41
LMNA P02545 3/20 0.37
PCNA P12004 3/20 0.37
THRA P10827 2/20 0.37
HPGD P15428 2/20 0.37
ABCB11 O95342 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6854236 0.96 HSD17B10 (0.41) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL7719544 0.89 ALDH1A1 (0.53) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL4623369 0.88 MAPT (0.41) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL17267847 0.84 HSD17B10 (0.41) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL6856738 0.84 ALDH1A1 (0.49) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL6852477 0.80 MAPT (0.45) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL28338635 0.79 GAA (0.39) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL28464375 0.77 MAPT (0.45) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL7714315 0.75 MAPT (0.50) MAPTTHRBSMN1; SMN2GAAMEN1
SCHEMBL29462465 0.74 ALDH1A1 (0.65) MAPTTHRBSMN1; SMN2GAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
US-20210309866-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-07 US disclosed
EP-3812805-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-04-28 EP disclosed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
US-10570269-B2 Composition containing microparticles TOKYO OHKA KOGYO CO., LTD. (JP) 2020-02-25 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
US-20190225804-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-25 US disclosed
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-17 US disclosed
US-20180194930-A1 COMPOSITION CONTAINING MICROPARTICLES TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-12 US disclosed
US-9981914-B2 2018-05-29 US disclosed
EP-3275940-A1 ENERGY-SENSITIVE RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-01-31 EP disclosed
EP-2947112-B1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO LTD (JP) 2017-09-13 EP disclosed
US-20170115563-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-04-27 US disclosed
US-9410055-B2 Polybenzoxazole resin and precursor thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-08-09 US disclosed
US-20150337084-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-26 US disclosed
EP-2947112-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-25 EP disclosed
EP-2695906-A1 POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF Mitsubishi Gas Chemical Company, Inc. (JP) 2014-02-12 EP disclosed
US-20130324662-A1 POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-12-05 US disclosed
US-6780561-B2 FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD KANSAI PAINT CO., LTD. (JP) 2004-08-24 US disclosed
US-20030143480-A1 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board KANSAI PAINT CO., LTD. (JP) 2003-07-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180194930-A1 COMPOSITION CONTAINING MICROPARTICLES CHMP4B, EXOSC10, EXOSC9 MAPT 35/4885THRB 4203/4885SMN1; SMN2 1444/4885
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element SLC9A2, SLC9A1, NHERF1 MAPT 2522/4885THRB 4643/4885SMN1; SMN2 4063/4885
US-10570269-B2 Composition containing microparticles CHMP4B, EXOSC10, EXOSC9 MAPT 35/4885THRB 4203/4885SMN1; SMN2 1444/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.