Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.53 |
| ▸ | PARP3 | Q9Y6F1 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.50 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.45 |
| ▸ | STS | P08842 | 2/20 | 0.44 |
| ▸ | DRD1 | P21728 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | ALDH5A1 | P51649 | 1/20 | 0.39 |
| ▸ | ABAT | P80404 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CASP6 | P55212 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1663469 | 0.86 | PARP10 (0.65) | PARP10PARP3ALDH1A1KDM4ECYP2A6 | |
| SCHEMBL6853611 | 0.86 | ALDH1A1 (0.64) | ALDH1A1KDM4ECYP2A6LMNAALDH1A3 | |
| SCHEMBL5050902 | 0.86 | PARP10 (0.65) | PARP10PARP3ALDH1A1KDM4ECYP2A6 | |
| SCHEMBL4615766 | 0.83 | ALDH1A1 (0.76) | ALDH1A1KDM4ECYP2A6LMNAALDH1A3 | |
| SCHEMBL6142753 | 0.83 | PARP10 (0.50) | PARP10PARP3ALDH1A1KDM4ECYP2A6 | |
| SCHEMBL9264469 | 0.83 | ALDH1A1 (0.76) | PARP10PARP3ALDH1A1KDM4ECYP2A6 | |
| SCHEMBL6852168 | 0.81 | SRC (0.47) | ALDH1A1KDM4ELMNASMN1; SMN2KMT2A | |
| SCHEMBL24512622 | 0.79 | PIM1 (0.43) | ALDH1A1KDM4ECYP2A6LMNASMN1; SMN2 | |
| SCHEMBL24512641 | 0.79 | PTPRZ1 (0.46) | PARP10PARP3ALDH1A1KDM4ECYP2A6 | |
| SCHEMBL97639 | 0.77 | ALDH1A1 (0.59) | PARP10PARP3ALDH1A1KDM4ECYP2A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-20210309866-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-07 | — | — | US | disclosed |
| EP-3812805-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-04-28 | — | — | EP | disclosed |
| CN-112334795-A | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2021-02-05 | — | — | CN | disclosed |
| CN-107429059-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-106575080-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-08-11 | — | — | CN | disclosed |
| US-10696845-B2 | Energy-sensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-10570269-B2 | Composition containing microparticles | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-02-25 | — | — | US | disclosed |
| EP-3275940-B1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-18 | — | — | EP | disclosed |
| CN-105579907-B | Radiation-sensitive composition and pattern production method | 东京应化工业株式会社 | 2019-12-17 | — | — | CN | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-9890250-B2 | Method for producing polybenzoxazole resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-02-13 | — | — | US | disclosed |
| EP-3275940-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2018-01-31 | — | — | EP | disclosed |
| EP-2947112-B1 | METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2017-09-13 | — | — | EP | disclosed |
| US-20170115563-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| CN-105579907-A | Radiation-sensitive composition and pattern production method | TOKYO OHKA KOGYO CO LTD | 2016-05-11 | — | — | CN | disclosed |
| US-20150337084-A1 | METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-26 | — | — | US | disclosed |
| EP-2947112-A1 | METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-25 | — | — | EP | disclosed |
| US-6780561-B2 | FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD | KANSAI PAINT CO., LTD. (JP) | 2004-08-24 | — | — | US | disclosed |
| US-20030143480-A1 | For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board | KANSAI PAINT CO., LTD. (JP) | 2003-07-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | SLC9A2, SLC9A1, NHERF1 | PARP10 4462/4885PARP3 4535/4885ALDH1A1 3686/4885 |
| US-10570269-B2 | Composition containing microparticles | CHMP4B, EXOSC10, EXOSC9 | PARP10 3701/4885PARP3 4162/4885ALDH1A1 1737/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.