Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B1 | P14061 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.41 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.41 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.41 |
| ▸ | HTR2B | P41595 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.41 |
| ▸ | ESR1 | P03372 | 5/20 | 0.41 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | GFER | P55789 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL70009 | 0.79 | CES2 (0.54) | ESR2ESR1MAPTHTTGFER | |
| SCHEMBL674175 | 0.79 | TDP1 (0.46) | MAPTHTTALDH1A1MEN1TP53 | |
| SCHEMBL1819662 | 0.79 | SORT1 (0.38) | CHRM1TBXA2RADRA1AESR1MAPT | |
| SCHEMBL30104503 | 0.79 | SORT1 (0.38) | CHRM1TBXA2RADRA1AESR1MAPT | |
| SCHEMBL29444190 | 0.79 | TDP1 (0.46) | MAPTHTTALDH1A1MEN1TP53 | |
| SCHEMBL29384682 | 0.77 | HSD17B1 (0.56) | HSD17B1CYP3A4ESR2ESR1MAPT | |
| SCHEMBL96129 | 0.77 | HSD17B1 (0.56) | HSD17B1CYP3A4ESR2ESR1MAPT | |
| SCHEMBL24146412 | 0.76 | ALDH1A1 (0.50) | CYP3A4ALOX15ESR2MAPTALDH1A1 | |
| SCHEMBL20776932 | 0.76 | IDO1 (0.33) | KMT2A | |
| SCHEMBL16078374 | 0.76 | FLT1 (0.44) | CYP3A4HTR2BALDH1A1MEN1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4147830-A | Recording sheet | FUJI PHOTO FILM CO., LTD. (JP) | 1979-04-03 | — | — | US | claimed |
| CN-110741043-B | Thermoplastic resin composition and molded article | 大科能宇菱通株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-113993955-A | Resin composition for coating and molded article | 大科能宇菱通株式会社 | 2022-01-28 | — | — | CN | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-6242533-B1 | POLYVINYLPHENOL; GOOD PATTERN SHAPE, HEAT RESISTANCE, RESOLUTION, AND SENSITIVITY IN RESISTS FOR LITHOGRAPHY | GUN EI CHEMICAL INDUSTRY CO., LTD. (JP) | 2001-06-05 | — | — | US | disclosed |
| US-6211328-B1 | IN PRESENCE OF AN ACID | GUN EI CHEMICAL INDUSTRY CO., LTD (JP) | 2001-04-03 | — | — | US | disclosed |
| US-4233431-A | HEAT AND CHEMICAL RESISTANT STABILIZERS-POLYCARBONATE | BAYER AKTIENGESELLSCHAFT (DE) | 1980-11-11 | — | — | US | disclosed |
| US-4147830-A | Recording sheet | FUJI PHOTO FILM CO., LTD. (JP) | 1979-04-03 | — | — | US | disclosed |
| US-4142035-A | Polycondensates containing hydroxyquinoline end groups, their use for the preparation of polymers containing metals and metal containing polycondensates | BAYER AKTIENGESELLSCHAFT (DE) | 1979-02-27 | — | — | US | disclosed |
| US-4137219-A | STABILIZERS | BAYER AKTIENGESELLSCHAFT (DE) | 1979-01-30 | — | — | US | disclosed |
| US-4076887-A | Recording sheets | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |