Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.70 |
| ▸ | MEN1 | O00255 | 8/20 | 0.68 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.68 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.66 |
| ▸ | TOP2A | P11388 | 1/20 | 0.60 |
| ▸ | ABL1 | P00519 | 1/20 | 0.59 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.59 |
| ▸ | BCR | P11274 | 1/20 | 0.59 |
| ▸ | ALPI | P09923 | 1/20 | 0.56 |
| ▸ | ALPG | P10696 | 1/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | PIM1 | P11309 | 2/20 | 0.52 |
| ▸ | PIM3 | Q86V86 | 2/20 | 0.52 |
| ▸ | PIM2 | Q9P1W9 | 2/20 | 0.52 |
| ▸ | GAA | P10253 | 5/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.51 |
| ▸ | RAB9A | P51151 | 1/20 | 0.51 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30122702 | 1.00 | ALDH1A1 (0.70) | ALDH1A1MEN1KMT2ATRPA1TOP2A | |
| SCHEMBL28388362 | 0.86 | TRPA1 (0.62) | ALDH1A1MEN1KMT2ATRPA1TOP2A | |
| Ethyl Vanillin SCHEMBL2536111 | 0.83 | ALDH1A1 (0.88) | ALDH1A1MEN1KMT2ATOP2AABL1 | |
| SCHEMBL685917 | 0.83 | TRPA1 (0.58) | ALDH1A1MEN1KMT2ATRPA1TOP2A | |
| SCHEMBL31619156 | 0.83 | ALDH1A1 (0.51) | ALDH1A1MEN1KMT2ATRPA1L3MBTL1 | |
| SCHEMBL6198028 | 0.83 | ALDH1A1 (0.51) | ALDH1A1MEN1KMT2ATRPA1L3MBTL1 | |
| Ethyl Vanillin SCHEMBL28149909 | 0.83 | ALDH1A1 (0.93) | ALDH1A1MEN1KMT2ATOP2AABL1 | |
| SCHEMBL685626 | 0.82 | TRPA1 (0.57) | ALDH1A1MEN1KMT2ATRPA1TOP2A | |
| SCHEMBL8630168 | 0.82 | ALDH1A1 (0.70) | ALDH1A1MEN1KMT2ATOP2AABL1 | |
| SCHEMBL20865261 | 0.82 | ALDH1A1 (0.70) | ALDH1A1MEN1KMT2ATOP2AABL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4103576-A1 | 3'-KETOGLYCOSIDE COMPOUND FOR THE SLOW RELEASE OF A VOLATILE ALCOHOL | Glycoscience, S.L. (ES) | 2022-12-21 | — | — | EP | claimed |
| WO-2021160670-A1 | 3'-KETOGLYCOSIDE COMPOUND FOR THE SLOW RELEASE OF A VOLATILE ALCOHOL | GLYCOSCIENCE, S.L. (ES) | 2021-08-19 | — | — | WO | claimed |
| CN-119709577-A | Recombinant strain for expressing phenolic acid decarboxylase as well as construction method and application thereof | 南京工业大学 | 2025-03-28 | — | — | CN | disclosed |
| EP-3636678-B1 | POLY(P-HYDROXYSTYRENE) EPOXY RESIN, AND SYNTHESIS AND USE THEREOF | HUBEI GURUN TECH CO LTD (CN) | 2024-01-17 | — | — | EP | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| JP-2022185807-A | Umami enhancer | 曽田香料株式会社 | 2022-12-15 | — | — | JP | disclosed |
| CN-108255018-B | Photoresist composition comprising poly (p-hydroxystyrene) epoxy resin as film-forming resin | 湖北固润科技股份有限公司 | 2020-12-11 | — | — | CN | disclosed |
| CN-108864341-B | Poly (p-hydroxystyrene) epoxy resin, and synthesis and application thereof | 湖北固润科技股份有限公司 | 2020-10-13 | — | — | CN | disclosed |
| US-20200199273-A1 | POLY-P-HYDROXYSTYRENE EPOXY RESINS, SYNTHESIS AND APPLICATION THEREOF | Hubei Gurun Technology Co., Ltd (CN) | 2020-06-25 | — | — | US | disclosed |
| EP-3636678-A1 | POLY(P-HYDROXYSTYRENE) EPOXY RESIN, AND SYNTHESIS AND USE THEREOF | Hubei Gurun Technology Co., Ltd (CN) | 2020-04-15 | — | — | EP | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| EP-0179532-B1 | PERFUME COMPOSITION AND PERFUMED PRODUCTS WHICH CONTAIN ONE OR MORE O-ALKOXYPHENOLS AS PERFUME COMPONENT | NAARDEN INTERNATIONAL N.V. (NL) | 1987-08-19 | — | — | EP | disclosed |
| US-4650604-A | VANILLA | NAARDEN INTERNATIONAL N. V. (NL) | 1987-03-17 | — | — | US | disclosed |
| EP-0179532-A1 | Perfume composition and perfumed products which contain one or more o-alkoxyphenols as perfume component | NAARDEN INTERNATIONAL N.V. (NL) | 1986-04-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110059400-A1 | PHOTORESIST COMPOSITION | C1R, C1S, CCNT1 | ALDH1A1 2162/4885MEN1 1989/4885KMT2A 2110/4885 |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | ALDH1A1 1016/4885MEN1 1119/4885KMT2A 1331/4885 |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | PHOSPHO1, RER1, RIF1 | ALDH1A1 3361/4885MEN1 2581/4885KMT2A 1210/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | ALDH1A1 706/4885MEN1 1707/4885KMT2A 807/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.