Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B1 | P14061 | 2/20 | 0.56 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.56 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.56 |
| ▸ | PKM | P14618 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | ESR1 | P03372 | 3/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.48 |
| ▸ | HTT | P42858 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | BACE1 | P56817 | 1/20 | 0.46 |
| ▸ | JAK2 | O60674 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30449384 | 1.00 | HSD17B1 (0.56) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL7909326 | 0.85 | ALOX5 (0.46) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL10336411 | 0.84 | HSD17B1 (0.43) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL12040088 | 0.84 | PKM (0.67) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL1362391 | 0.83 | HSP90AA1 (0.38) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL10937936 | 0.83 | PKM (0.51) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL10955744 | 0.82 | PKM (0.46) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL7910314 | 0.82 | TYR (0.47) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL385574 | 0.82 | PKM (0.75) | HSD17B1HSP90AA1HSP90AB1PKMPOLB | |
| SCHEMBL20262941 | 0.82 | HSD17B1 (0.41) | HSD17B1HSP90AA1HSP90AB1PKMPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 356 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1928819-B1 | A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHOQUINONESULFONYL ESTER | COUNCIL SCIENT IND RES (IN) | 2011-04-06 | — | — | EP | claimed |
| EP-1928819-A1 | A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHOQUINONESULFONYL ESTER | COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) | 2008-06-11 | — | — | EP | claimed |
| US-7355021-B2 | Single pot process for the preparation of diazonaphthoquinonesulfonyl ester | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-04-08 | — | — | US | claimed |
| WO-2007026374-A1 | A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHOQUINONESULFONYL ESTER | COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) | 2007-03-08 | — | — | WO | claimed |
| US-20070049742-A1 | Single Pot Process For The Preparation Of Diazonaphthoquinonesulfonyl Ester | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2007-03-01 | — | — | US | claimed |
| WO-2004043402-A2 | MODIFIED NUCLEOSIDES AS ANTIVIRAL AGENTS | PHARMASSET, INC. (US) | 2004-05-27 | — | — | WO | claimed |
| WO-2025132182-A2 | POST-EXPOSURE BAKE LESS CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2025-06-26 | — | — | WO | disclosed |
| US-20250011507-A1 | POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-01-09 | — | — | US | disclosed |
| EP-4435517-A1 | POLYCYCLIC AROMATIC HYDROCARBON-BASED PHOTO-CURABLE RESIN COMPOSITION | Nissan Chemical Corporation (JP) | 2024-09-25 | — | — | EP | disclosed |
| CN-118235092-A | Polycyclic aromatic hydrocarbon-based photocurable resin composition | 日产化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| US-11921425-B2 | Hard mask-forming composition and method for manufacturing electronic component | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-03-05 | — | — | US | disclosed |
| CN-117126638-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-28 | — | — | CN | disclosed |
| CN-116880125-A | Positive photosensitive resin composition, use thereof, and metal patterning method using the same | 深圳市容大感光科技股份有限公司 | 2023-10-13 | — | — | CN | disclosed |
| US-5853948-A | Positive photoresist compositions and multilayer resist materials using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5728504-A | Positive photoresist compositions and multilayer resist materials using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-03-17 | — | — | US | disclosed |
| US-5702861-A | BLEND OF ALKALI SOLUBLE RESIN, QUINONE DIAZIDE COMPOUND AND AN AROMATIC POLYHYDROXY COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| US-5702862-A | ALKALI SOLUBLE RESIN; A QUINONE DIAZIDE GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070049742-A1 | Single Pot Process For The Preparation Of Diazonaphthoquinonesulfonyl Ester | DDT, STS, DHODH | HSD17B1 2064/4885HSP90AA1 3898/4885HSP90AB1 3982/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.