SCHEMBL68910

SCHEMBL68910

C[SiH](CCl)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.32
TP53 P04637 1/20 0.32
KMT2A Q03164 1/20 0.31
ALDH1A1 P00352 2/20 0.31
HIF1A Q16665 2/20 0.31
TRPA1 O75762 1/20 0.31
MAPK1 P28482 1/20 0.31
GSK3B P49841 1/20 0.31
LMNA P02545 1/20 0.30
ALOX12 P18054 1/20 0.30
ACHE P22303 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9746880 0.80
SCHEMBL9514224 0.77 KCNA3 (0.30)
SCHEMBL2229742 0.76 TP53 (0.39) TSHRTP53KMT2AALDH1A1LMNA
SCHEMBL27880412 0.75 ACHE (0.36) LMNAACHE
SCHEMBL27856424 0.74 LOXL2 (0.38) TP53
SCHEMBL2414663 0.74 TSHR (0.38) TSHRTP53ALDH1A1HIF1ATRPA1
SCHEMBL27427909 0.72 TSHR (0.35) TSHRKMT2AALDH1A1HIF1ATRPA1
SCHEMBL3134496 0.72 ALDH1A1 (0.33) TSHRKMT2AALDH1A1HIF1ATRPA1
SCHEMBL9239449 0.72 TP53 (0.42) TSHRTP53ALDH1A1TRPA1ALOX12
SCHEMBL8992405 0.72 TP53 (0.36) TP53ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120041121-A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN ASAKAWA KOJI (JP) 2012-02-16 US claimed
US-20140284306-A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN KABUSHIKI KAISHA TOSHIBA (JP) 2014-09-25 US disclosed
US-8778201-B2 Method for manufacturing porous structure and method for forming pattern KABUSHIKI KAISHA TOSHIBA (JP) 2014-07-15 US disclosed
US-8435416-B2 Method for manufacturing porous structure and method for forming pattern KABUSHIKI KAISHA TOSHIBA (JP) 2013-05-07 US disclosed
US-8395305-B2 Display device and method of manufacturing transparent substrate for display device KABUSHIKI KAISHA TOSHIBA (JP) 2013-03-12 US disclosed
US-8394877-B2 Method for manufacturing porous structure and method for forming pattern KABUSHIKA KAISHA TOSHIBA (JP) 2013-03-12 US disclosed
US-8129087-B2 Block copolymer and substrate processing method CANON KABUSHIKI KAISHA (JP) 2012-03-06 US disclosed
US-20120037594-A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN ASAKAWA KOJI (JP) 2012-02-16 US disclosed
US-20120041121-A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN ASAKAWA KOJI (JP) 2012-02-16 US disclosed
US-20120037595-A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN ASAKAWA KOJI (JP) 2012-02-16 US disclosed
US-7524428-B2 Display device and method of manufacturing transparent substrate for display device KABUSHIKI KAISHA TOSHIBA (JP) 2009-04-28 US disclosed
US-7517466-B2 Method for manufacturing porous structure and method for forming pattern KABUSHIKI KAISHA TOSHIBA (JP) 2009-04-14 US disclosed
WO-2008047817-A1 PATTERN FORMING METHOD CANON KABUSHIKI KAISHA (JP) 2008-04-24 WO disclosed
US-20060231525-A1 Forming microphase-separated structure in film of graft or block copolymer with a chain of polyacrylonitrile, polycyclohexadiene derivative, polybutadiene, polysilane, polysiloxane, polyamic acid or polyaniline and thermally decomposable polymer chain; heating to decompose the decomposable phase; etching ASAKAWA KOJI 2006-10-19 US disclosed
US-7097781-B2 Method for manufacturing porous structure and method for forming pattern KABUSHIKI KAISHA TOSHIBA (JP) 2006-08-29 US disclosed
US-7090784-B2 Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer KABUSHIKI KAISHA TOSHIBA (JP) 2006-08-15 US disclosed
US-20040227446-A1 Display device and method of manufacturing transparent substrate for display device KABUSHIKI KAISHA TOSHIBA (JP) 2004-11-18 US disclosed
US-20040050816-A1 Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer KABUSHIKI KAISHA TOSHIBA (JP) 2004-03-18 US disclosed
US-20030222048-A1 Method for manufacturing porous structure and method for forming pattern KABUSHIKI KAISHA TOSHIBA (JP) 2003-12-04 US disclosed
US-6565763-B1 Method for manufacturing porous structure and method for forming pattern KABUSHIKI KAISHA TOSHIBA (JP) 2003-05-20 US disclosed