Water

Water

SCHEMBL689940

O.O.O.O.[Ge]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL3358769 1.00
Water SCHEMBL689537 1.00
Water SCHEMBL6515859 1.00
Water SCHEMBL5597091 1.00
Water SCHEMBL9694222 1.00
Fluoride SCHEMBL4810356 0.82
Water O 15 SCHEMBL25428717 0.71
Water SCHEMBL15484266 0.71
Water SCHEMBL2121635 0.71
Water SCHEMBL4407393 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3467004-B1 METHOD FOR PRODUCING BIO-PET RESIN SUNTORY HOLDINGS LTD (JP) 2022-12-14 EP claimed
US-20190135975-A1 METHOD FOR PRODUCING BIO-PET RESIN SUNTORY HOLDINGS LIMITED (JP) 2019-05-09 US claimed
EP-3467004-A1 METHOD FOR PRODUCING BIO-PET RESIN Suntory Holdings Limited (JP) 2019-04-10 EP claimed
WO-2024070038-A1 CO-POLYESTER RESIN 東洋紡エムシー株式会社 2024-04-04 WO disclosed
WO-2024070037-A1 CO-POLYESTER RESIN 東洋紡エムシー株式会社 2024-04-04 WO disclosed
CN-220317919-U Hydrochloric acid dissolving device for metal germanium processing 昆明汇泉高纯半导材料有限公司 2024-01-09 CN disclosed
WO-2023203975-A1 COPOLYMER POLYESTER RESIN 東洋紡エムシー株式会社 2023-10-26 WO disclosed
US-11795298-B2 Polyester resin composition, light-reflector component containing same, and light reflector TOYOBO MC CORPORATION (JP) 2023-10-24 US disclosed
WO-2023157778-A1 CURABLE RESIN, CURED PRODUCT OF SAME, AND RESIN COMPOSITION 三菱瓦斯化学株式会社 2023-08-24 WO disclosed
WO-2023157780-A1 CURABLE RESIN PRODUCTION METHOD 三菱瓦斯化学株式会社 2023-08-24 WO disclosed
WO-2023157777-A1 CURABLE RESIN, CURED PRODUCT THEREOF, RESIN COMPOSITION, AND PRODUCTION METHOD FOR CURABLE RESIN 三菱瓦斯化学株式会社 2023-08-24 WO disclosed
US-20080182963-A1 reacting terephthalic acid with ethylene glycol in the presence of polymerization catalysts, to form polyethylene terephthalate, then granulation and heat treatment of the resultant polyester particles; condensation polymerization MITSUBISHI CHEMICAL CORPORATION (JP) 2008-07-31 US disclosed
EP-1939238-A1 APPARATUS FOR HEAT TREATMENT OF POLYESTER PARTICLE AND METHOD OF MULTISTAGE SOLID-PHASE POLYCONDENSATION OF POLYESTER PARTICLE Mitsubishi Chemical Corporation (JP) 2008-07-02 EP disclosed
EP-1939237-A1 METHOD FOR PRODUCING POLYESTER Mitsubishi Chemical Corporation (JP) 2008-07-02 EP disclosed
EP-1854820-A1 PROCESS FOR CONTINUOUS PRODUCTION OF POLYESTER, POLYESTER PREPOLYMER GRANULE AND POLYESTER Mitsubishi Chemical Corporation (JP) 2007-11-14 EP disclosed
US-20070065649-A1 Polyester resin TOYO BOSEKI KAUSHIKI KAISHA (JP) 2007-03-22 US disclosed
US-7138481-B2 Polycondensing ethylene glycol and terephthalic acid or ester with 5.5% or less comonomer thereof via esterification or transesterification, melt polymerizing, then subjecting the melt polymerization polymer to solid-phase polycondensation at a fast rate MITSUBISHI CHEMICAL CORPORATION (JP) 2006-11-21 US disclosed
US-20050239997-A1 Process for producing polyester resin MITSUBISHI CHEMICAL CORPORATION (JP) 2005-10-27 US disclosed
EP-1518878-A1 PROCESS FOR PRODUCING POLYESTER RESIN Mitsubishi Chemical Corporation (JP) 2005-03-30 EP disclosed
EP-0381456-A1 Vapor-phase growth of epitaxial crystals SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-08-08 EP disclosed