SCHEMBL6914100

SCHEMBL6914100

Cc1cc(CCl)ccc1CCl

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 1/20 0.37
▸ ESR2 Q92731 1/20 0.37
▸ TTR P02766 3/20 0.34
▸ PON1 P27169 2/20 0.33
▸ KMT2A Q03164 2/20 0.32
▸ KDM4E B2RXH2 2/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ HIF1A Q16665 1/20 0.32
▸ TSHR P16473 1/20 0.31
▸ PTGS1 P23219 1/20 0.31
▸ PTGS2 P35354 1/20 0.31
▸ SKP2 Q13309 1/20 0.31
▸ CA1 P00915 2/20 0.31
▸ CA2 P00918 2/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9073249 0.86 NOS3 (0.35) ESR1ESR2TTRPON1KDM4E
SCHEMBL17748246 0.81 GABRA1 (0.47) ESR1KMT2AKDM4ECYP3A4CYP2C19
SCHEMBL5598364 0.81 PON1 (0.37) ESR1ESR2TTRPON1KMT2A
SCHEMBL29377856 0.80 ALDH1A1 (0.40) ESR1ESR2TTRKMT2AKDM4E
SCHEMBL540384 0.80 ALDH1A1 (0.40) ESR1ESR2TTRKMT2AKDM4E
SCHEMBL5492827 0.78 ESR1 (0.38) ESR1ESR2TTRKDM4ECYP3A4
SCHEMBL96223 0.78 KMT2A (0.46) PON1KMT2AKDM4ENPSR1MAPK1
SCHEMBL30613070 0.78 KMT2A (0.46) PON1KMT2AKDM4ENPSR1MAPK1
SCHEMBL19512351 0.78 ALDH1A1 (0.39) ESR1ESR2TTRKMT2AKDM4E
SCHEMBL3700915 0.77 CA1 (0.34) TTRKMT2ATSHRCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116490355-A Compound, resin composition, resin sheet, resin cured product, and laminated substrate TDK株式会社 2023-07-25 — — CN disclosed
WO-2022209495-A1 COMPOUND, RESIN COMPOSITION, RESIN SHEET, RESIN CURED OBJECT, AND LAMINATED SUBSTRATE TDK株式会社 2022-10-06 — — WO disclosed
US-20040075802-A1 Sealant for liquid crystal display cell, composition for liquid crystal display cell sealant and liquid crystal display element MITSUI CHEMICALS, INC. (JP) 2004-04-22 — — US disclosed
US-6664224-B2 Microbiocides; sterilization TOAGOSEI CO., LTD. (JP) 2003-12-16 — — US disclosed
US-20020006888-A1 Novel quaternary ammonium salt and process for the preparation thereof TOAGOSEI CO., LTD. 2002-01-17 — — US disclosed
EP-1156030-A1 Novel quaternary ammonium salt and process for the preparation thereof TOAGOSEI CO., LTD. (JP) 2001-11-21 — — EP disclosed
EP-1153952-A1 SEALING AGENT FOR LIQUID-CRYSTAL DISPLAY CELL, COMPOSITION FOR SEALING AGENT FOR LIQUID-CRYSTAL DISPLAY CELL, AND LIQUID-CRYSTAL DISPLAY ELEMENT Mitsui Chemicals, Inc. (JP) 2001-11-14 — — EP disclosed
US-5312913-A Complexes of electron donors and electron acceptors IDEMITSU KOSAN CO., LTD. (JP) 1994-05-17 — — US disclosed
EP-0311387-B1 AROMATIC AMINE RESINS, THEIR PRODUCTION PROCESS AND THERMOSETTING RESIN COMPOSITIONS MAKING USE OF THE SAME MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-08-11 — — EP disclosed
US-5175280-A Electroconductive complexes; heat resistance IDEMITSU KOSAN CO., LTD. (JP) 1992-12-29 — — US disclosed
US-5145949-A Production process for making aromatic amine resins MITSUI TOATSU CHEMICALS, INC. (JP) 1992-09-08 — — US disclosed
US-5106953-A Reacting aromatic amines with bishalogenomethyl derivatives; curing agents or raw materials for polyamides MITSUI TOATSU CHEMICALS, INC. (JP) 1992-04-21 — — US disclosed
EP-0454874-A1 THIA- AND/OR SELENAFULVALENYL COMPOUND IDEMITSU KOSAN COMPANY LIMITED (JP) 1991-11-06 — — EP disclosed
US-5051494-A A bismaleimide and an amino resin MITSUI TOATSU CHEMICALS, INC. (JP) 1991-09-24 — — US disclosed
US-4937318-A Aromatic amine resins MITSUI TOATSU CHEMICALS, INC. (JP) 1990-06-26 — — US disclosed
EP-0311387-A2 Aromatic amine resins, their production process and thermosetting resin compositions making use of the same MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-04-12 — — EP disclosed
EP-0009787-B2 PROCESS FOR THE MONOHALOGENATION OF ALKYLBENZENES IN ALPHA POSITION BAYER AG (DE) 1986-07-09 — — EP disclosed
US-4331821-A ULTRAVIOLET RADIATION OF A VAPORIZED ALKYLBENZEN AND HALOGEN GAS MIXTURE BAYER AKTIENGESELLSCHAFT (DE) 1982-05-25 — — US disclosed
EP-0009787-B1 PROCESS FOR THE MONOHALOGENATION OF ALKYLBENZENES IN ALPHA POSITION BAYER AG (DE) 1982-01-13 — — EP disclosed
EP-0009787-A2 Process for the monohalogenation of alkylbenzenes in alpha position BAYER AG (DE) 1980-04-16 — — EP disclosed
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