SCHEMBL6935316

SCHEMBL6935316

CCOC(=O)C(C)=COC(C)=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.48
LMNA P02545 2/20 0.48
HSD17B10 Q99714 1/20 0.48
GLO1 Q04760 1/20 0.47
NPSR1 Q6W5P4 2/20 0.42
MAPT P10636 2/20 0.38
TRPA1 O75762 1/20 0.38
CYP2D6 P10635 2/20 0.37
CYP2C19 P33261 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
S1PR4 O95977 1/20 0.37
S1PR1 P21453 1/20 0.37
MAPK1 P28482 1/20 0.37
TSHR P16473 2/20 0.36
ALOX15 P16050 1/20 0.36
MGAM O43451 1/20 0.36
GAA P10253 1/20 0.36
SI P14410 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11104761 0.83 ALDH1A1 (0.44) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL27759645 0.83 HCAR2 (0.45) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL11297581 0.83 ALOX15 (0.48) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL4928083 0.83 GLO1 (0.57) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL19447665 0.82 GLO1 (0.50) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL222772 0.82 GLO1 (0.50) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL322511 0.82 GLO1 (0.50) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL20815351 0.82 THRB (0.44) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL23529353 0.80 GLO1 (0.41) ALDH1A1LMNAHSD17B10GLO1NPSR1
SCHEMBL4805596 0.80 NPSR1 (0.41) ALDH1A1LMNAHSD17B10GLO1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114106749-B Low-viscosity thermosetting type shaving board starch adhesive and preparation method thereof 江南大学 2022-08-02 CN claimed
CN-109705505-B Preparation method of waterborne bi-component system acrylic resin with interpenetrating network structure 科思创树脂制造(佛山)有限公司 2022-04-08 CN claimed
CN-114106749-A Low-viscosity thermosetting particle board starch adhesive and preparation method thereof 江南大学 2022-03-01 CN claimed
CN-117924576-B High-temperature-resistant composite emulsion and preparation method and application thereof 上海长宣化工有限公司 2024-10-22 CN disclosed
CN-117924576-A High-temperature-resistant composite emulsion and preparation method and application thereof 上海长宣化工有限公司 2024-04-26 CN disclosed
WO-2023116055-A1 LOW-VISCOSITY THERMOSETTING PARTICLE BOARD STARCH ADHESIVE AND PREPARATION METHOD THEREFOR 江南大学 2023-06-29 WO disclosed
CN-114106749-B Low-viscosity thermosetting type shaving board starch adhesive and preparation method thereof 江南大学 2022-08-02 CN disclosed
CN-114497372-A Low-power-consumption field effect transistor and preparation method thereof 闽都创新实验室 2022-05-13 CN disclosed
CN-109705505-B Preparation method of waterborne bi-component system acrylic resin with interpenetrating network structure 科思创树脂制造(佛山)有限公司 2022-04-08 CN disclosed
CN-114106749-A Low-viscosity thermosetting particle board starch adhesive and preparation method thereof 江南大学 2022-03-01 CN disclosed
CN-111037481-B Magnesium oxide resin grinding stone for grinding electrical contact, preparation, recycling and residual removing method 福达合金材料股份有限公司 2021-07-30 CN disclosed
US-20030232193-A1 Dry film resist and printed circuit board producing method FUJI PHOTO FILM CO., LTD. (JP) 2003-12-18 US disclosed
US-6576409-B2 Comprising a resinous compound of an acid-decomposing ester of a monovinyl ether, a (meth)acrylic ester capable of forming a carboxylic acid via decomposition by the action of an acid, an acid generator and a polymerization inhibitor TAIYO INK MANUFACTURING CO., LTD. (JP) 2003-06-10 US disclosed
US-20020102501-A1 Photosensitive resin composition and method for formation of resist pattern by use thereof ICHIKAWA MIYAKO (JP) 2002-08-01 US disclosed
US-6338936-B1 RESIN WITH ESTER GROUP, UNSATURATED BOND, GENERATION OF ACID BY EXPOSURE TO ACID AND CATALYSIS TAIYO INK MANUFACTURING CO., LTD. (JP) 2002-01-15 US disclosed
EP-0960133-A1 WATER-BASED EMULSION POLYMERS WHICH RESIST BLOCKING UNION CARBIDE CORPORATION (US) 1999-12-01 EP disclosed
WO-1998035994-A1 WATER-BASED EMULSION POLYMERS WHICH RESIST BLOCKING UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION ; (US) 1998-08-20 WO disclosed
EP-0630386-A4 EMULSION PRESSURE-SENSITIVE ADHESIVE POLYMERS EXHIBITING EXCELLENT GUILLOTINE PERFORMANCE. 1995-01-25 EP disclosed
EP-0630386-A1 EMULSION PRESSURE-SENSITIVE ADHESIVE POLYMERS EXHIBITING EXCELLENT GUILLOTINE PERFORMANCE. AVERY DENNISON CORP (US) 1994-12-28 EP disclosed
WO-1993018072-A1 EMULSION PRESSURE-SENSITIVE ADHESIVE POLYMERS EXHIBITING EXCELLENT GUILLOTINE PERFORMANCE AVERY DENNISON CORPORATION (US) 1993-09-16 WO disclosed