Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | SCN1A | P35498 | 3/20 | 0.36 |
| ▸ | SCN2A | Q99250 | 3/20 | 0.36 |
| ▸ | SCN3A | Q9NY46 | 3/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
| ▸ | MTOR | P42345 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482432 | 0.92 | KCNN4 (0.35) | KCNN4MAPK1SCN1ASCN2ASCN3A | |
| SCHEMBL706928 | 0.88 | KIF11 (0.38) | KCNN4MAPK1SIGMAR1KMT2AKIF11 | |
| SCHEMBL7618073 | 0.87 | CYP1A2 (0.40) | SCN1ASCN2ASCN3ASIGMAR1LMNA | |
| SCHEMBL3482436 | 0.83 | KCNN4 (0.38) | KCNN4MAPK1SCN1ASCN2ASCN3A | |
| SCHEMBL704326 | 0.83 | KCNN4 (0.40) | KCNN4MAPK1SIGMAR1TSHRTAAR1 | |
| SCHEMBL3481596 | 0.81 | KIF11 (0.36) | KCNN4MAPK1SIGMAR1KMT2AKIF11 | |
| SCHEMBL27614347 | 0.78 | KIF11 (0.35) | KCNN4SIGMAR1KMT2AALDH1A1KIF11 | |
| SCHEMBL3481487 | 0.78 | MAPK1 (0.40) | KCNN4MAPK1SCN1ASCN2ASCN3A | |
| SCHEMBL11418602 | 0.77 | KCNN4 (0.33) | KCNN4MAPK1SIGMAR1CYP2D6NPSR1 | |
| SCHEMBL28944305 | 0.77 | SIGMAR1 (0.38) | MAPK1SIGMAR1MEN1NR1I2KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| EP-4056604-B1 | METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE | KURARAY CO (JP) | 2023-08-02 | — | — | EP | disclosed |
| EP-3564280-B1 | COPOLYMER OF 1, 3, 7-OCTATRIENE AND STYRENE AND HYDRIDE THEREOF | KURARAY CO (JP) | 2023-07-26 | — | — | EP | disclosed |
| EP-4163311-A1 | COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER | Kuraray Co., Ltd. (JP) | 2023-04-12 | — | — | EP | disclosed |
| EP-4163312-A1 | COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER | Kuraray Co., Ltd. (JP) | 2023-04-12 | — | — | EP | disclosed |
| EP-3564274-B1 | 1, 3, 7-OCTATRIENE POLYMER, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID POLYMER | KURARAY CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| CN-115181223-A | Low-gloss matte auxiliary agent, preparation method thereof and formed body | 铨盛聚碳科技股份有限公司 | 2022-10-14 | — | — | CN | disclosed |
| EP-4056604-A1 | METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE | Kuraray Co., Ltd. (JP) | 2022-09-14 | — | — | EP | disclosed |
| US-11332567-B2 | Copolymer of 1, 3, 7-octatriene and butadiene, hydride thereof, and method for producing said copolymer | KURARAY CO., LTD. (JP) | 2022-05-17 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| EP-1889862-A1 | Curable resin composition, process for producing the same, and coated object made with the same | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| EP-1172393-B1 | CURABLE RESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND COATED OBJECT MADE WITH THE SAME | DAICEL CHEM (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |
| US-6437090-B1 | ORGANOMETALLIC COMPOUND CAPABLE OF REVERSIBLY DISSOLVING AND PRECIPITATING THROUGH HEATING AND COOLING; ORGANOSILICON COMPOUND; ONE LIGAND CONTAINS AN ALKYL GROUP HAVING 10 OR MORE CARBON ATOMS; EPOXY RESIN; STORAGE STABLE; ONLY CURES ON HEAT | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-08-20 | — | — | US | disclosed |
| EP-1172393-A1 | CURABLE RESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND COATED OBJECT MADE WITH THE SAME | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| US-5439746-A | Formed by coating or impregnating a reinforcement sheet and curing; mechanical strength; corrosion and heat resistance; electrical properties | KABUSHIKI KAISHA TOSHIBA (JP) | 1995-08-08 | — | — | US | disclosed |