SCHEMBL703301

SCHEMBL703301

CC(C)(C)OC(=O)CC1C2CC3CC(C2)CC1(CC(=O)O)C3

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.38
MEN1 O00255 1/20 0.35
MAPK1 P28482 1/20 0.35
KMT2A Q03164 1/20 0.35
HSD11B1 P28845 3/20 0.33
HSD11B2 P80365 1/20 0.32
DGAT1 O75907 1/20 0.31
CACNA1H O95180 1/20 0.31
ALDH1A1 P00352 1/20 0.31
POLB P06746 1/20 0.31
HDAC4 P56524 1/20 0.30
HDAC1 Q13547 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30477996 0.81 HSD11B1 (0.46) HSD11B1ALDH1A1POLB
SCHEMBL702226 0.81 EPHX2 (0.40) EPHX2MEN1MAPK1KMT2AHSD11B1
SCHEMBL26217994 0.75 ALDH1A1 (0.38) EPHX2HSD11B1ALDH1A1POLB
SCHEMBL700514 0.72 ALDH1A1 (0.36) HSD11B1HSD11B2ALDH1A1POLB
SCHEMBL15470852 0.72 EPHX2 (0.36) EPHX2MEN1MAPK1KMT2ACACNA1H
SCHEMBL2812495 0.70 ALDH1A1 (0.39) HSD11B1ALDH1A1POLB
SCHEMBL5697635 0.70 HSD11B1 (0.52) EPHX2MEN1MAPK1KMT2AHSD11B1
SCHEMBL134689 0.70 ALDH1A1 (0.50) EPHX2MEN1MAPK1KMT2AHSD11B1
Acetic Acid SCHEMBL703302 0.69 ALDH1A1 (0.46) EPHX2MEN1MAPK1KMT2AHSD11B1
SCHEMBL3510746 0.68 ALDH1A1 (0.40) EPHX2MEN1KMT2AHSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8802348-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2014-08-12 US disclosed
US-8377627-B2 Compound and radiation-sensitive composition JSR CORPORATION (JP) 2013-02-19 US disclosed
EP-1961739-B1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION JSR CORP (JP) 2012-10-17 EP disclosed
US-8273837-B2 Compound, polymer, and resin composition JSR CORPORATION (JP) 2012-09-25 US disclosed
US-20120164586-A1 PATERN FORMING METHOD JSR CORPORATION (JP) 2012-06-28 US disclosed
US-8182977-B2 Polymer and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2012-05-22 US disclosed
US-8173351-B2 Compound and radiation-sensitive composition JSR CORPORATION (JP) 2012-05-08 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-8084188-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2011-12-27 US disclosed
US-20110117489-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2011-05-19 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100203447-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed
US-20100203452-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed
US-20100068647-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-03-18 US disclosed
US-20090318652-A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION JSR CORPORATION (JP) 2009-12-24 US disclosed
US-20090305161-A1 LIQUID IMMERSION LITHOGRAPHY JSR CORPORATION (JP) 2009-12-10 US disclosed
US-20090274977-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2009-11-05 US disclosed
EP-2100870-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR Corporation (JP) 2009-09-16 EP disclosed
EP-1961739-A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION JSR Corporation (JP) 2008-08-27 EP disclosed
EP-1953595-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090318652-A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION ERCC4, RAD51, RTF1 EPHX2 1843/4885MEN1 3559/4885MAPK1 1102/4885
US-20110117489-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION ERCC2, RAD51, ATM EPHX2 2677/4885MEN1 1024/4885MAPK1 2010/4885
US-20090274977-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION RAD51, SLC11A2, XRCC6 EPHX2 3619/4885MEN1 135/4885MAPK1 595/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.