Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.35 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.34 |
| ▸ | CES2 | O00748 | 2/20 | 0.33 |
| ▸ | CES1 | P23141 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | CRHBP | P24387 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11152840 | 0.94 | LTA4H (0.36) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL27481788 | 0.88 | HPGD (0.37) | SMN1; SMN2TSHRGAAMAPT | |
| SCHEMBL2272064 | 0.86 | TP53 (0.35) | TP53 | |
| SCHEMBL7866284 | 0.79 | LTA4H (0.33) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL2268231 | 0.77 | SIGMAR1 (0.50) | SIGMAR1HTT | |
| SCHEMBL2266973 | 0.77 | CYP2C19 (0.39) | SIGMAR1TSHRHTTMEN1KMT2A | |
| SCHEMBL114779 | 0.77 | LTA4H (0.38) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL417994 | 0.77 | LTA4H (0.38) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL2272014 | 0.77 | TP53 (0.38) | CES2CES1TSHRTP53ALOX12 | |
| SCHEMBL2100897 | 0.76 | SIGMAR1 (0.47) | SIGMAR1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2001060932-A1 | ANTIFOULING PAINT COMPOSITION | J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) | 2001-08-23 | — | — | WO | claimed |
| US-9919300-B2 | 1-hexene production process | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-20 | — | — | US | disclosed |
| EP-2484685-B1 | TRANSITION METAL COMPLEX, PREPARATION METHOD FOR SAID TRANSITION METAL COMPLEX, TRIMERIZATION CATALYST, PREPARATION METHOD FOR 1-HEXENE, PREPARATION METHOD FOR ETHYLENE POLYMER, SUBSTITUTED CYCLOPENTADIENE COMPOUND, AND PREPARATION METHOD FOR SAID SUBSTITUTED CYCLOPENTADIENE COMPOUND | SUMITOMO CHEMICAL CO (JP) | 2017-11-01 | — | — | EP | disclosed |
| US-20170036200-A1 | 1-HEXENE PRODUCTION PROCESS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-09 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-20150105237-A1 | CATALYTIC COMPONENT FOR TRIMERIZATION AND TRIMERIZATION CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-16 | — | — | US | disclosed |
| US-20150105572-A1 | TRANSITION METAL COMPLEX | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-16 | — | — | US | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| WO-2001060932-A1 | ANTIFOULING PAINT COMPOSITION | J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) | 2001-08-23 | — | — | WO | disclosed |
| EP-0475184-B1 | Process for the production of peptides by solid phase synthesis | HOECHST AG (DE) | 1995-02-08 | — | — | EP | disclosed |
| EP-0475184-A1 | Process for the production of peptides by solid phase synthesis | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-03-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170036200-A1 | 1-HEXENE PRODUCTION PROCESS | AP1M1, HK1, CYC1 | LTA4H 1103/4885PCSK9 4787/4885PTGS2 1608/4885 |
| US-20150105572-A1 | TRANSITION METAL COMPLEX | AP1M1, AP3M1, EMC1 | LTA4H 1423/4885PCSK9 4730/4885PTGS2 2541/4885 |
| US-20150105237-A1 | CATALYTIC COMPONENT FOR TRIMERIZATION AND TRIMERIZATION CATALYST | AP1M1, AMY1A, AP3M1 | LTA4H 780/4885PCSK9 4373/4885PTGS2 1372/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.