SCHEMBL7047138

SCHEMBL7047138

CCCCOc1ccc(S2(OS(=O)(=O)c3ccc(C(F)(F)F)cc3)CCCC2)c2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 1/20 0.39
PTGDR2 Q9Y5Y4 1/20 0.38
SLC2A1 P11166 2/20 0.37
CACNA1H O95180 1/20 0.36
CACNA1B Q00975 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
PSEN1 P49768 2/20 0.35
PSEN2 P49810 1/20 0.35
APH1B Q8WW43 1/20 0.35
NCSTN Q92542 1/20 0.35
APH1A Q96BI3 1/20 0.35
PSENEN Q9NZ42 1/20 0.35
GAA P10253 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CNR1 P21554 1/20 0.35
CNR2 P34972 1/20 0.35
WDR5 P61964 1/20 0.34
FABP4 P15090 5/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3883695 0.89 SLC2A1 (0.42) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL36281 0.86 SLC2A1 (0.41) PTGDR2SLC2A1MEN1KMT2AGAA
SCHEMBL3873415 0.82 SLC2A1 (0.40) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL190940 0.82 SLC2A1 (0.38) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL448403 0.81 SLC2A1 (0.37) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL703653 0.81 KMT2A (0.44) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL3872557 0.78 FABP4 (0.42) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL701333 0.77 KMT2A (0.41) SLC2A1MEN1KMT2ACNR1CNR2
SCHEMBL36663 0.76 TSHR (0.43) SLC2A1MEN1KMT2AGAATDP1
SCHEMBL700903 0.76 KMT2A (0.40) SLC2A1MEN1KMT2ACNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed