SCHEMBL704978

SCHEMBL704978

CC(C)O[SiH](Cc1ccccc1)OC(C)C

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
TAAR1 Q96RJ0 4/20 0.40
SIGMAR1 Q99720 4/20 0.40
SLC6A2 P23975 2/20 0.40
MAOA P21397 1/20 0.40
SLC6A4 P31645 1/20 0.40
SLC6A3 Q01959 1/20 0.40
CYP2A6 P11509 1/20 0.40
ADORA2A P29274 1/20 0.40
ADORA1 P30542 1/20 0.40
SLC18A2 Q05940 1/20 0.38
CYP2D6 P10635 1/20 0.38
TP53 P04637 1/20 0.37
KDM4E B2RXH2 1/20 0.37
ALDH1A1 P00352 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
TRPA1 O75762 1/20 0.36
CALM1 P0DP23 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706393 0.79 SIGMAR1 (0.39) TSHRTAAR1SIGMAR1SLC6A2MAOA
SCHEMBL705468 0.76 SIGMAR1 (0.42) SIGMAR1CYP2D6ALDH1A1
SCHEMBL1313798 0.76 TRPA1 (0.37) TSHRTAAR1SIGMAR1SLC6A2MAOA
SCHEMBL21112803 0.75 TAAR1 (0.38) TSHRTAAR1SIGMAR1SLC6A2MAOA
SCHEMBL703613 0.75 SIGMAR1 (0.44) SIGMAR1MAOAALDH1A1
SCHEMBL28693788 0.75 TSHR (0.36) TSHRTAAR1SIGMAR1SLC6A2MAOA
SCHEMBL49102 0.75 TP53 (0.42) TSHRTP53KDM4EALDH1A1TDP1
SCHEMBL21112712 0.74 TAAR1 (0.36) TSHRTAAR1SIGMAR1SLC6A2MAOA
SCHEMBL63273 0.74 ALDH1A1 (0.34) SLC6A2SLC6A4SLC6A3ALDH1A1TDP1
SCHEMBL9505652 0.73 TP53 (0.40) TSHRTP53ALDH1A1CALM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4039666-A ANTICONVULSANT PHENYLSILANES DOW CORNING CORPORATION (US) 1977-08-02 US claimed
CN-109517099-B External electron donor, olefin polymerization catalyst system and application thereof 山东鲁晶化工科技有限公司 2021-07-30 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed