Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | LTA4H | P09960 | 1/20 | 0.32 |
| ▸ | MPO | P05164 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.31 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.30 |
| ▸ | MAOA | P21397 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.30 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.30 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28267120 | 0.84 | LMNA (0.32) | L3MBTL1LTA4HMPOLMNATRPA1 | |
| SCHEMBL715338 | 0.84 | LMNA (0.35) | LTA4HLMNASIGMAR1MEN1KMT2A | |
| SCHEMBL707194 | 0.81 | LTA4H (0.42) | L3MBTL1LTA4HTP53 | |
| SCHEMBL10356057 | 0.80 | L3MBTL1 (0.31) | L3MBTL1LTA4H | |
| SCHEMBL6699011 | 0.79 | SLC6A2 (0.31) | L3MBTL1LMNASIGMAR1TAAR1SLC6A2 | |
| SCHEMBL15914634 | 0.78 | TDP1 (0.32) | L3MBTL1LMNATP53POLBSIGMAR1 | |
| SCHEMBL19927035 | 0.76 | — | — | |
| SCHEMBL711280 | 0.76 | CA4 (0.35) | L3MBTL1LTA4HLMNATP53POLB | |
| SCHEMBL19927334 | 0.75 | — | — | |
| SCHEMBL706901 | 0.74 | ALDH1A1 (0.33) | L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3507104-B1 | PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU | BRIDGESTONE CORP (JP) | 2024-03-27 | — | — | EP | disclosed |
| US-10975178-B2 | Production of cis-1,4-polydienes with multiple silane functional groups prepared by in-situ hydrosilylation of polymer cement | BRIDGESTONE CORPORATION (JP) | 2021-04-13 | — | — | US | disclosed |
| US-20190211120-A1 | Production Of Cis-1,4-Polydienes With Multiple Silane Functional Groups Prepared By In-Situ Hydrosilylation Of Polymer Cement | BRIDGESTONE CORPORATION (JP) | 2019-07-11 | — | — | US | disclosed |
| EP-3507104-A1 | PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU | Bridgestone Corporation (JP) | 2019-07-10 | — | — | EP | disclosed |
| CN-109438633-A | A kind of organosilicon toughener and its synthetic method with anti-drop effect | 广东优科艾迪高分子材料有限公司 | 2019-03-08 | — | — | CN | disclosed |
| CN-109337025-A | A kind of anti-dripping agent and its synthetic method with toughening effect | 广东优科艾迪高分子材料有限公司 | 2019-02-15 | — | — | CN | disclosed |
| CN-109320937-A | A kind of organic silicon fibre retardant and preparation method thereof based on poroid inorganic matter | 铨盛（云浮）新型聚合物有限公司 | 2019-02-12 | — | — | CN | disclosed |
| CN-109320772-A | A kind of anti-dripping agent and preparation method thereof containing organosilicon and inorganic silicon | 广东优科艾迪高分子材料有限公司 | 2019-02-12 | — | — | CN | disclosed |
| CN-109320674-A | A kind of anti-dripping agent and preparation method thereof containing PTFE and organosilicon | 广东优科艾迪高分子材料有限公司 | 2019-02-12 | — | — | CN | disclosed |
| CN-109306169-A | A kind of hydridization organic matter and the organic silicon fibre retardant of nano silica and preparation method thereof | 铨盛（云浮）新型聚合物有限公司 | 2019-02-05 | — | — | CN | disclosed |
| CN-109293856-A | A kind of the organosilicon toughener and its synthetic method of polymer overmold nano-inorganic substance | 铨盛聚碳科技股份有限公司 | 2019-02-01 | — | — | CN | disclosed |
| CN-109233160-A | A kind of organic silicon fibre retardant and preparation method thereof containing PTFE and nano silica | 铨盛聚碳科技股份有限公司 | 2019-01-18 | — | — | CN | disclosed |
| WO-2018045291-A1 | PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BY IN-SITU HYDROSILYLATION OF POLYMER CEMENT | BRIDGESTONE CORPORATION (JP) | 2018-03-08 | — | — | WO | disclosed |
| CN-102947393-B | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2015-03-11 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |