Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | RIPK1 | Q13546 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 7/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.32 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.32 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.32 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.32 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704037 | 0.80 | CYP2D6 (0.39) | RIPK1TAAR1 | |
| SCHEMBL703697 | 0.80 | RIPK1 (0.35) | LMNARIPK1TAAR1 | |
| SCHEMBL705750 | 0.78 | LMNA (0.38) | LMNAMEN1KMT2APOLBTRPA1 | |
| SCHEMBL1314423 | 0.78 | KIF11 (0.39) | LMNAMEN1KMT2AGRIN1GRIN2A | |
| SCHEMBL15302359 | 0.75 | MEN1 (0.33) | LMNAMEN1KMT2APOLBATM | |
| SCHEMBL706206 | 0.74 | LMNA (0.41) | LMNARIPK1MEN1KMT2APOLB | |
| SCHEMBL3166658 | 0.73 | RIPK1 (0.43) | LMNARIPK1MEN1KMT2ATRPA1 | |
| SCHEMBL6758593 | 0.72 | MAPK1 (0.42) | RIPK1GRIN1GRIN2AGRIN2DGRIN2C | |
| SCHEMBL9161407 | 0.72 | LMNA (0.42) | LMNAMEN1KMT2APOLBTRPA1 | |
| SCHEMBL756292 | 0.71 | LMNA (0.45) | LMNARIPK1MEN1KMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |