Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.33 |
| ▸ | CACNB2 | Q08289 | 1/20 | 0.33 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.31 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.31 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.31 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.31 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707150 | 0.86 | — | — | |
| SCHEMBL706818 | 0.79 | MAOA (0.36) | ESR1ESR2TDP1AOC3TAAR1 | |
| SCHEMBL705425 | 0.79 | ESR1 (0.34) | ESR1ESR2TDP1AOC3TSHR | |
| SCHEMBL1316040 | 0.77 | ESR1 (0.38) | ESR1ESR2TDP1AOC3TSHR | |
| SCHEMBL2102454 | 0.77 | LMNA (0.35) | AOC3TSHRTAAR1SLC6A2MAOA | |
| SCHEMBL1538902 | 0.75 | AOC3 (0.34) | ESR1ESR2TDP1AOC3 | |
| SCHEMBL9571239 | 0.75 | TSHR (0.39) | AOC3TSHR | |
| SCHEMBL28456589 | 0.74 | TDP1 (0.39) | ESR1ESR2CACNA2D1CACNB2CACNA1C | |
| SCHEMBL13766348 | 0.72 | ESR1 (0.37) | ESR1ESR2CACNA2D1CACNB2CACNA1C | |
| SCHEMBL9763717 | 0.72 | ESR1 (0.37) | ESR1ESR2TDP1TSHRTAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3782599-B1 | DENTAL POLYMERIZABLE COMPOSITION BASED ON CONDENSED SILANES | VOCO GMBH (DE) | 2025-09-17 | — | — | EP | disclosed |
| US-11992538-B2 | Polymerizable dental composition based on condensed silanes | VOCO GMBH (DE) | 2024-05-28 | — | — | US | disclosed |
| US-20210052469-A1 | POLYMERIZABLE DENTAL COMPOSITION BASED ON CONDENSED SILANES | VOCO GMBH (DE) | 2021-02-25 | — | — | US | disclosed |
| EP-3782599-A1 | DENTAL POLYMERIZABLE COMPOSITION BASED ON CONDENSED SILANES | VOCO GmbH (DE) | 2021-02-24 | — | — | EP | disclosed |
| CN-103515457-B | The manufacture method and photocell of base material with antireflection film | 日挥触媒化成株式会社 | 2017-08-25 | — | — | CN | disclosed |
| CN-103515457-A | Method for manufacturing substrate with anti-reflection film and photovoltaic cell | JGC CATALYSTS & CHEMICALS LTD | 2014-01-15 | — | — | CN | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| CN-101180579-B | Polysilane compound-containing lower layer film forming composition for lithography | NISSAN CHEMICAL IND LTD | 2012-06-27 | — | — | CN | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-8163460-B2 | Underlayer coating forming composition for lithography containing polysilane compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20080318158-A1 | Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
| EP-1999167-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | Novolen Technology Holdings, C.V. (NL) | 2008-12-10 | — | — | EP | disclosed |
| CN-101180579-A | Polysilane compound-containing lower layer film forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2008-05-14 | — | — | CN | disclosed |
| WO-2007106348-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | NOVOLEN TECHNOLOGY HOLDINGS C.V. (NL) | 2007-09-20 | — | — | WO | disclosed |
| US-20070213204-A1 | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECHNOLOGY HOLDINGS C.V. | 2007-09-13 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11992538-B2 | Polymerizable dental composition based on condensed silanes | NCAPH, RCC1, NCAPD2 | ESR1 755/4885ESR2 1775/4885CACNA2D1 2564/4885 |
| US-20210052469-A1 | POLYMERIZABLE DENTAL COMPOSITION BASED ON CONDENSED SILANES | NCAPH, RCC1, NCAPD2 | ESR1 755/4885ESR2 1775/4885CACNA2D1 2564/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.