Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 2/20 | 0.36 |
| ▸ | OPRM1 | P35372 | 2/20 | 0.36 |
| ▸ | OPRK1 | P41145 | 2/20 | 0.36 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.36 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.36 |
| ▸ | SCN1A | P35498 | 2/20 | 0.35 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.35 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.35 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706389 | 0.89 | LTA4H (0.43) | LMNACYP1A2TSHRALDH1A1GPR88 | |
| SCHEMBL28688705 | 0.87 | LTA4H (0.43) | LMNATSHRHTR2AGPR88 | |
| SCHEMBL115878 | 0.83 | TAAR1 (0.40) | TAAR1LMNAMEN1KMT2AHTR2A | |
| SCHEMBL19809427 | 0.82 | LMNA (0.45) | LMNACYP1A2CHRM2ADRA2ACYP2D6 | |
| SCHEMBL17937688 | 0.81 | ADRB2 (0.41) | LMNAMEN1KMT2ATSHRSLC6A2 | |
| SCHEMBL17937755 | 0.81 | MEN1 (0.36) | LMNAMEN1KMT2AOPRM1CYP1A2 | |
| SCHEMBL63381 | 0.81 | DPP4 (0.37) | TAAR1LMNACYP1A2ADRA2ACYP2D6 | |
| SCHEMBL702246 | 0.81 | LMNA (0.39) | TAAR1LMNAMEN1KMT2AHTT | |
| SCHEMBL28200037 | 0.81 | LMNA (0.44) | LMNACYP1A2CHRM2ADRA2ACYP2D6 | |
| SCHEMBL706757 | 0.79 | AOC3 (0.38) | LMNAMEN1KMT2AHTTOPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108250754-B | Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2022-01-25 | — | — | CN | disclosed |
| CN-107075255-B | Encapsulating material composition for LED | 日产化学工业株式会社 | 2020-05-22 | — | — | CN | disclosed |
| CN-106062044-B | Polysiloxane copolymer, and antistatic agent and resin composition containing same | 信越化学工业株式会社 | 2019-11-26 | — | — | CN | disclosed |
| CN-105916913-B | Polysiloxane copolymer and antistatic agent containing it | 广荣化学工业株式会社 | 2019-10-25 | — | — | CN | disclosed |
| US-10066059-B2 | Sealing material composition for LED | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| CN-108250754-A | Containing silicone resin composition, containing silicone resin film, silica membrane, illuminated display element panel and luminous display unit | 东京应化工业株式会社 | 2018-07-06 | — | — | CN | disclosed |
| US-20170306095-A1 | SEALING MATERIAL COMPOSITION FOR LED | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| CN-106062044-A | Polysiloxane copolymer, and antistatic agent and resin composition containing same | 信越化学工业株式会社 | 2016-10-26 | — | — | CN | disclosed |
| CN-105916913-A | Polysiloxane copolymer and antistatic agent comprising same | 广荣化学工业株式会社 | 2016-08-31 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| EP-1085022-A1 | A method of manufacturing an acyloxysilane compound having functional groups bonded to silicon atoms via Si-C- bonds | Dow Corning Asia, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6060620-A | Method for manufacturing an acyloxysilane compound having functional groups bonded to silicon atoms via SI--C bonds | DOW CORNING ASIA, LTD. (JP) | 2000-05-09 | — | — | US | disclosed |
| US-6048994-A | Selective hydrosilylation method using hydrido (hydrocarbonoxy) silane | DOW CORNING ASIA, LTD. (JP) | 2000-04-11 | — | — | US | disclosed |