Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705118 | 0.83 | ADRB2 (0.38) | — | |
| SCHEMBL1313968 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL29201621 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL29201696 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL21059164 | 0.77 | HSD17B10 (0.35) | HSD17B10 | |
| SCHEMBL1609052 | 0.76 | HSD17B10 (0.31) | HSD17B10 | |
| SCHEMBL66057 | 0.75 | LMNA (0.35) | — | |
| SCHEMBL5425853 | 0.74 | — | — | |
| SCHEMBL14600508 | 0.74 | — | — | |
| SCHEMBL365876 | 0.74 | HTT (0.31) | HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12098261-B2 | Near-infrared absorbing material fine particle dispersion body, near-infrared absorbing body, near-infrared absorbing substance laminated body and combined structure for near infrared absorption | SUMITOMO METAL MINING CO., LTD. (JP) | 2024-09-24 | — | — | US | disclosed |
| US-20240270908-A1 | POLYSILSESQUIOXANE COMPOSITION AND CURED PRODUCT | NIPPON SHOKUBAI CO., LTD. (JP) | 2024-08-15 | — | — | US | disclosed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| CN-117043276-A | Polysilsesquioxane composition and cured product | 株式会社日本触媒 | 2023-11-10 | — | — | CN | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| CN-111699421-B | Near-infrared-absorbing-material fine particle dispersion, near-infrared absorber, near-infrared-absorbing-material laminate, and near-infrared-absorbing sandwich structure | 住友金属矿山株式会社 | 2023-03-24 | — | — | CN | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-7005532-B2 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2006-02-28 | — | — | US | disclosed |
| CN-1717797-A | Semiconductor multilayer interconnection forming method | TOKYO OHKA KOGYO CO LTD (JP) | 2006-01-04 | — | — | CN | disclosed |
| EP-1566836-A1 | SEMICONDUCTOR MULTILAYER INTERCONNECTION FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-08-24 | — | — | EP | disclosed |
| US-20050112383-A1 | Undercoating layer material for lithography and wiring forming method using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |
| US-20050020845-A1 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| EP-1428828-A1 | PROCESS FOR PREPARATION OF ALKOXYSILANES | TOAGOSEI CO., LTD. (JP) | 2004-06-16 | — | — | EP | disclosed |
| CN-1495535-A | Etching solution for forming bimetallic mosaic structure craft and base phate treatment method | ͬ�Ϳ�ҵ��ʽ���� | 2004-05-12 | — | — | CN | disclosed |
| US-20030180550-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2003-09-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | MLX, HAX1, GRIA3 | HSD17B10 1543/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.