Edetic Acid

Edetic Acid

SCHEMBL7071979

O.O.O.O=C([O-])CN(CCN(CC(=O)[O-])CC(=O)[O-])CC(=O)[O-].[Na+].[Na+].[Na+].[Na+]

nearest known ligand 0.73

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Edetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACE known ✓ P12821 1/20 0.48
CHRM2 known ✓ P08172 1/20 0.46
ADRA2A known ✓ P08913 1/20 0.46
SLC6A2 known ✓ P23975 1/20 0.46
SLC6A4 known ✓ P31645 1/20 0.46
ADRA1A known ✓ P35348 1/20 0.46
DRD3 known ✓ P35462 1/20 0.46
SLC6A3 known ✓ Q01959 1/20 0.46
HDAC3 known ✓ O15379 1/20 0.33
HDAC1 known ✓ Q13547 1/20 0.33
HDAC2 known ✓ Q92769 1/20 0.33
HDAC8 known ✓ Q9BY41 1/20 0.33
KDM4E B2RXH2 2/20 0.73
ALOX15 P16050 2/20 0.73
MAPT P10636 1/20 0.73
SMN1; SMN2 Q16637 1/20 0.73
TDP1 Q9NUW8 2/20 0.48
EYA2 O00167 1/20 0.48
APP P05067 1/20 0.48
BLM P54132 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Edetic Acid SCHEMBL1714086 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL10607814 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL8374505 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL978169 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL991956 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL506851 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL8470881 1.00 KDM4E (0.73) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL5273812 0.97 KDM4E (0.70) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL3394139 0.97 KDM4E (0.70) KDM4EALOX15MAPTSMN1; SMN2TDP1
Edetic Acid SCHEMBL17747958 0.97 KDM4E (0.70) KDM4EALOX15MAPTSMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111587402-A Resist composition and resist film 日本瑞翁株式会社 2020-08-25 CN disclosed
EP-0840168-B1 Aminopolycarboxylic acid chelating agent, heavy metal chelate compound thereof, photographic additive and processing method FUJI PHOTO FILM CO LTD (JP) 2003-06-18 EP disclosed
EP-0950922-A1 Silver halide color photographic lightsensitive material FUJI PHOTO FILM CO., LTD. (JP) 1999-10-20 EP disclosed
EP-0840168-A2 Aminopolycarboxylic acid chelating agent, heavy metal chelate compound thereof, photographic additive and processing method FUJI PHOTO FILM CO., LTD. (JP) 1998-05-06 EP disclosed
US-5310634-A Phenylenediamine derivative FUJI PHOTO FILM CO., LTD. (JP) 1994-05-10 US disclosed
US-5250401-A Using solution containing metal chelating compound as bleaching agent FUJI PHOTO FILM CO., LTD. (JP) 1993-10-05 US disclosed
US-5075208-A Releasing a photographically useful compound upon reduction FUJI PHOTO FILM CO., LTD. (JP) 1991-12-24 US disclosed
US-5043258-A Silver halide photographic emulsion FUJI PHOTO FILM CO. (JP) 1991-08-27 US disclosed
US-5008181-A Silver halide photographic materials FUJI PHOTO FILM CO. (JP) 1991-04-16 US disclosed
EP-0369424-A1 Silver halide photographic photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1990-05-23 EP disclosed