Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | MTNR1A | P48039 | 7/20 | 0.38 |
| ▸ | MTNR1B | P49286 | 7/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | CES2 | O00748 | 2/20 | 0.35 |
| ▸ | CES1 | P23141 | 2/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL702608 | 0.91 | ALDH1A1 (0.42) | ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1 | |
| SCHEMBL6554058 | 0.90 | PTGS2 (0.39) | ALDH1A1L3MBTL1CES2CES1PTGS2 | |
| SCHEMBL708241 | 0.87 | L3MBTL1 (0.41) | ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1 | |
| SCHEMBL704041 | 0.87 | L3MBTL1 (0.41) | ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1 | |
| SCHEMBL6545706 | 0.87 | NAAA (0.43) | ALDH1A1LMNACES2CES1PTGS2 | |
| SCHEMBL705572 | 0.85 | ALDH1A1 (0.41) | ALDH1A1MTNR1AMTNR1BMAPTLMNA | |
| SCHEMBL703232 | 0.84 | ALDH1A1 (0.40) | ALDH1A1MTNR1AMTNR1BMAPTLMNA | |
| SCHEMBL706299 | 0.83 | ALDH1A1 (0.42) | ALDH1A1MTNR1AMTNR1BMAPTLMNA | |
| SCHEMBL705416 | 0.82 | ALDH1A1 (0.39) | ALDH1A1MTNR1AMTNR1BMAPTLMNA | |
| SCHEMBL705553 | 0.77 | PTGS2 (0.40) | ALDH1A1L3MBTL1CES2CES1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |