Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARL | Q9H300 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28663684 | 0.97 | — | — | |
| SCHEMBL28449846 | 0.97 | — | — | |
| SCHEMBL29202816 | 0.94 | — | — | |
| SCHEMBL28537874 | 0.82 | — | — | |
| SCHEMBL25317166 | 0.72 | POLB (0.47) | — | |
| SCHEMBL6261102 | 0.69 | PIK3CD (0.32) | — | |
| SCHEMBL2754568 | 0.69 | LMNA (0.33) | — | |
| SCHEMBL12386592 | 0.69 | BRD4 (0.32) | — | |
| SCHEMBL64814 | 0.68 | PARL (0.50) | PARL | |
| SCHEMBL3087267 | 0.68 | PARL (0.50) | PARL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109429511-A | Positive photoresist composition, photoresist pattern using the same, and method for manufacturing photoresist pattern | 株式会社LG化学 | 2019-03-05 | — | — | CN | claimed |
| CN-102786825-A | Organic passivation layer composition, transistor and/or electronic device including organic passivation layer fabricated therefrom | SAMSUNG ELECTRONICS CO LTD | 2012-11-21 | — | — | CN | claimed |
| CN-115583902-B | Preparation method of alkynyl thioether compound | 江苏医药职业学院 | 2024-02-13 | — | — | CN | disclosed |
| CN-110462516-A | Positive photoresist composition, pattern produced therefrom and method for producing pattern | LG CHEMICAL LTD | 2019-11-15 | — | — | CN | disclosed |
| CN-109429511-A | Positive photoresist composition, photoresist pattern using the same, and method for manufacturing photoresist pattern | 株式会社LG化学 | 2019-03-05 | — | — | CN | disclosed |
| EP-2763963-A1 | ENANTIONSELECTIVE PROCESSES TO INSECTICIDAL 3-ARYL-3-TRIFLUOROMETHYL-SUBSTITUTED PYRROLIDINES | Syngenta Participations AG (CH) | 2014-08-13 | — | — | EP | disclosed |
| WO-2013050301-A1 | ENANTIONSELECTIVE PROCESSES TO INSECTICIDAL 3-ARYL-3-TRIFLUOROMETHYL-SUBSTITUTED PYRROLIDINES | SYNGENTA PARTICIPATIONS AG (CH) | 2013-04-11 | — | — | WO | disclosed |
| CN-102985876-A | Positive photosensitive resin composition and organic light emitting device screen comprising same | LG CHEMICAL LTD | 2013-03-20 | — | — | CN | disclosed |
| CN-102786825-A | Organic passivation layer composition, transistor and/or electronic device including organic passivation layer fabricated therefrom | SAMSUNG ELECTRONICS CO LTD | 2012-11-21 | — | — | CN | disclosed |
| CN-102070746-A | Polymer for resist protective layer and polymer composition containing the same | CHEIL IND INC | 2011-05-25 | — | — | CN | disclosed |
| CN-101462956-A | (meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | CHEIL IND INC (KR) | 2009-06-24 | — | — | CN | disclosed |
| CN-101462957-A | Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods | CHEIL IND INC (KR) | 2009-06-24 | — | — | CN | disclosed |
| WO-2003064384-A2 | ENVIRONMENT FRIENDLY REAGENTS AND PROCESS FOR TRIFLUOROMETHYLSULFINYLATION OF ORGANIC COMPOUNDS | VIRBAC S.A. (FR) | 2003-08-07 | — | — | WO | disclosed |
| EP-1331222-A1 | Environment friendly reagents and process for halogenoalkylsulfinylation of organic compounds | VIRBAC S.A. (FR) | 2003-07-30 | — | — | EP | disclosed |