Tromethamine

Tromethamine

SCHEMBL7126002

NC(CO)(CO)CO.[V]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

DHFRGARTPTGFRPTGIRPTGS1PTGS2TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8envmurAthyA

The experimentally established mechanism targets of Tromethamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tromethamine SCHEMBL975 0.95
Tromethamine SCHEMBL3696191 0.95
Tromethamine SCHEMBL17484 0.95 MEN1 (1.00)
Tromethamine SCHEMBL445853 0.91 MEN1 (0.91)
Tromethamine SCHEMBL8379571 0.91
Tromethamine SCHEMBL7068977 0.91
Tromethamine SCHEMBL2035496 0.91
Tromethamine SCHEMBL2263148 0.91 MEN1 (0.91)
Tromethamine SCHEMBL6063594 0.91
Tromethamine SCHEMBL9298764 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6384162-B1 COORDINATION CATALYST OF VANADIUM TRIS DIKETATE, HALOGENATED ORGANOALUMINUM, AND CHLORINATED ESTER ACTIVATOR; ETHYLENE PROPYLENE TETRAPOLYMERS WITH TWO DIOLEFIN MONOMERS SUCH AS 5-ETHYLIDENE-2-NORBORNENE AND 5-VINYLIDINE-2-NORBORNENE BAYER AKTIENGESELLSCHAFT (DE) 2002-05-07 US claimed
CN-112292477-A Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials ASM IP私人控股有限公司 2021-01-29 CN disclosed
CN-112292478-A Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials ASM IP私人控股有限公司 2021-01-29 CN disclosed
CN-111825570-A Forming material, forming method and novel compound 气相成长株式会社 2020-10-27 CN disclosed
US-20200331944-A1 COMPOUND GAS-PHASE GROWTH LTD. (JP) 2020-10-22 US disclosed
JP-2003049269-A METHOD FOR PRODUCING VANADIUM-CONTAINING OXIDE THIN FILM BY VAPOR-PHASE GROWTH METHOD USING VANADIUM TRIS (β-DIKETONATE) AND RAW MATERIAL SOLUTION KOJUNDO CHEM LAB CO LTD 2003-02-21 JP disclosed