Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5514094 | 0.98 | ALDH1A1 (0.38) | ALDH1A1SMN1; SMN2 | |
| SCHEMBL17338022 | 0.86 | ALDH1A1 (0.32) | ALDH1A1SMN1; SMN2 | |
| SCHEMBL9985728 | 0.79 | HSD11B1 (0.34) | — | |
| SCHEMBL27171366 | 0.78 | — | — | |
| SCHEMBL6553000 | 0.73 | — | — | |
| SCHEMBL1556670 | 0.72 | HSD11B1 (0.33) | — | |
| SCHEMBL4400847 | 0.71 | HSD11B1 (0.34) | ALDH1A1 | |
| Lithium Ion SCHEMBL5888895 | 0.71 | — | — | |
| SCHEMBL1193589 | 0.71 | HSD11B1 (0.37) | ALDH1A1 | |
| SCHEMBL17008352 | 0.70 | ALDH1A1 (0.44) | ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1398309-B1 | NOVEL ADAMANTANE DERIVATIVE | IDEMITSU KOSAN CO (JP) | 2008-02-20 | — | — | EP | claimed |
| US-7071352-B2 | Processes for preparation of 2-alkyl-2-adamantyl esters | TOKUYAMA CORPORATION (JP) | 2006-07-04 | — | — | US | claimed |
| US-6737215-B2 | Photoresist composition for deep ultraviolet lithography | CLARIANT FINANCE (BVI) LTD (VG) | 2004-05-18 | — | — | US | claimed |
| EP-1392745-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | Clariant Finance (BVI) Limited (VG) | 2004-03-03 | — | — | EP | claimed |
| US-6696595-B2 | ESTERIFYING AN ADAMANTANE COMPOUND HAVING AN -OH GROUP, -OM GROUP OR OR DIVALENT ALIPHATIC HYDROCARBON GROUP, AND DISTILLING THE ESTER PRODUCT IN PRESENCE OF AN INERT HETEROCYCLIC COMPOUND WHICH IS STABLE UNDER DISTILLATION | TOKUYAMA CORPORATION (JP) | 2004-02-24 | — | — | US | claimed |
| EP-1388027-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD. (CH) | 2004-02-11 | — | — | EP | claimed |
| US-6686429-B2 | COPOLYMER OF AN ETHENICALLY UNSATURATED NITRILE-CONTAINING MONOMER AND A NONAROMATIC CYCLIC UNIT SUCH AS TERT-BUTYL NORBORENECARBOXYLATE; SENSITIVE IN DEEP ULTRAVIOLET REGION; MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | claimed |
| US-20030158437-A1 | Processes for preparation of 2-alkyl-2adamantyl esters | TOKUYAMA CORPORATION (JP) | 2003-08-21 | — | — | US | claimed |
| US-20030120107-A1 | Process of the preparation of high-purity alkyladamantyl esters | TOKUYAMA CORPORATION (JP) | 2003-06-26 | — | — | US | claimed |
| EP-1314713-A1 | PROCESSES FOR PREPARATION OF 2-ALKYL-2-ADAMANTYL ESTERS | TOKUYAMA CORPORATION (JP) | 2003-05-28 | — | — | EP | claimed |
| EP-1284256-A1 | PROCESS OF THE PREPARATION OF HIGH-PURITY ALKYLADAMANTYL ESTERS | TOKUYAMA CORPORATION (JP) | 2003-02-19 | — | — | EP | claimed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| EP-1125917-A1 | Alkyladamantyl esters and their preparation | Chem Search Corporation (KR) | 2001-08-22 | — | — | EP | claimed |
| US-6222061-B1 | FOR PREPARING FLAME RETARDANTS | CHEM SEARCH CORP. (KR) | 2001-04-24 | — | — | US | claimed |
| CN-108659223-B | Cyclodextrin derivative type photosensitive resin, preparation method thereof, resist composition based on cyclodextrin derivative type photosensitive resin and application of resist composition | 中科院广州化学有限公司南雄材料生产基地 | 2020-12-04 | — | — | CN | disclosed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | disclosed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030120107-A1 | Process of the preparation of high-purity alkyladamantyl esters | TET2, MSMO1, ACMSD | ALDH1A1 591/4885SMN1; SMN2 4307/4885 |
| US-20030158437-A1 | Processes for preparation of 2-alkyl-2adamantyl esters | ADSL, GRIN2D, SLC43A1 | ALDH1A1 403/4885SMN1; SMN2 1592/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.