Bromide

Bromide

SCHEMBL7201741

CCC(=O)C[S+]1CCCCC1.[Br-]

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.39
FFAR3 O14843 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685964 0.98 TDP1 (0.41) TDP1FFAR3
Bromide SCHEMBL7197738 0.98 TDP1 (0.41) TDP1
SCHEMBL106330 0.95 TDP1 (0.43) TDP1FFAR3
Bromide SCHEMBL2916644 0.83
Trifluoromethanesulfonic Acid SCHEMBL6550644 0.80
SCHEMBL6727780 0.80 CES2 (0.35) TDP1FFAR3
SCHEMBL6550943 0.78 EPHX2 (0.33)
Trifluoromethanesulfonic Acid SCHEMBL6548925 0.78
SCHEMBL6728105 0.77 CES2 (0.36) FFAR3
SCHEMBL6731220 0.76 TDP1 (0.38) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6638685-B2 Resolution, sensitivity and smoothness on side surfaces of a transferred pattern; photolithography NEC CORPORATION (JP) 2003-10-28 US disclosed
US-6602647-B2 Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group NEC CORPORATION (JP) 2003-08-05 US disclosed
US-20020182535-A1 Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method NEC CORPORATION (JP) 2002-12-05 US disclosed
US-20020045122-A1 Sulfonium salt compound and resist composition and pattern forming method using the same NEC CORPORATION 2002-04-18 US disclosed
EP-1113334-A1 Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition NEC CORPORATION (JP) 2001-07-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020182535-A1 Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method ASIC1, ASIC3, SULT1A1 TDP1 2782/4885FFAR3 1534/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.