SCHEMBL7212907

SCHEMBL7212907

CN(C)CCc1c(O)cccc1C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 6/20 0.47
HTR2C P28335 5/20 0.47
ALDH1A1 P00352 3/20 0.46
KDM4E B2RXH2 2/20 0.46
HPGD P15428 2/20 0.46
HMGB1 P09429 2/20 0.46
CA12 O43570 2/20 0.46
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
CA7 P43166 2/20 0.46
CA9 Q16790 2/20 0.46
CA14 Q9ULX7 2/20 0.46
CA4 P22748 1/20 0.46
CA6 P23280 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
NAPRT Q6XQN6 1/20 0.46
G6PD P11413 1/20 0.44
CASP7 P55210 1/20 0.44
CASP6 P55212 1/20 0.44
HTR2B P41595 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8636129 0.85 KDM4E (0.47) HTR2AHTR2CALDH1A1KDM4EHPGD
SCHEMBL9481778 0.82 TAAR1 (0.43) HTR2AHTR2CALDH1A1SMN1; SMN2HTR1A
SCHEMBL9858 0.81 KDM4E (0.50) ALDH1A1KDM4EHPGDHMGB1CA12
SCHEMBL289432 0.78 KAT8 (0.50) ALDH1A1KDM4EHPGDHMGB1CA12
SCHEMBL28192723 0.78 SIGMAR1 (0.49) ALDH1A1KDM4EHPGDSMN1; SMN2HSD17B10
SCHEMBL1242279 0.77 ALDH1A1 (0.54) ALDH1A1KDM4EHPGDHMGB1CA12
SCHEMBL4473539 0.77 KAT8 (0.56) ALDH1A1KDM4EHSD17B10PLK1ALOX15
SCHEMBL11044630 0.76 ALDH1A1 (0.58) ALDH1A1KDM4EHPGDHMGB1CA12
SCHEMBL7074712 0.75 G6PD (0.51) HTR2AHTR2CHMGB1G6PDCASP7
SCHEMBL5273325 0.75 KAT8 (0.59) ALDH1A1KDM4EHSD17B10PLK1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0997777-B1 Photosensitive polymer composition, method for forming relief patterns, and electronic parts HITACHI CHEM DUPONT MICROSYS (JP) 2003-06-04 EP disclosed
US-5753407-A Polyamic acid composition KABUSHIKI KAISHA TOSHIBA (JP) 1998-05-19 US disclosed
US-5585217-A Polyamic acid composition KABUSHIKI KAISHA TOSHIBA (JP) 1996-12-17 US disclosed