Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL159368 | 0.96 | ALDH1A1 (0.42) | ALDH1A1LMNA | |
| Iodide SCHEMBL17865373 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| Hydrochloric Acid SCHEMBL1041197 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| Fluoride Ion SCHEMBL190627 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| SCHEMBL8406832 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| Bromide SCHEMBL28550755 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| SCHEMBL5044766 | 0.82 | ALDH1A1 (0.31) | ALDH1A1LMNA | |
| Sulfuric Acid SCHEMBL5039817 | 0.79 | CA5A (0.38) | ALDH1A1LMNA | |
| Water SCHEMBL190436 | 0.78 | — | — | |
| SCHEMBL5046885 | 0.77 | MEN1 (0.33) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 274 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250290013-A1 | CLEANING SOLUTION COMPOSITION USED AFTER METAL FILM POLISHING | KCTECH CO., LTD. (KR) | 2025-09-18 | — | — | US | claimed |
| CN-113789519-B | Application of cleaning liquid after chemical mechanical polishing | 上海新阳半导体材料股份有限公司 | 2024-02-02 | — | — | CN | claimed |
| CN-113774392-B | Cleaning liquid for chemical mechanical polishing and preparation method thereof | 上海新阳半导体材料股份有限公司 | 2023-12-01 | — | — | CN | claimed |
| EP-3037889-B1 | MEMBER FOR ELECTROPHOTOGRAPHY AND METHOD OF PRODUCING THE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KK (JP) | 2023-11-29 | — | — | EP | claimed |
| CN-113774391-B | Application of cleaning liquid after chemical mechanical polishing | 上海新阳半导体材料股份有限公司 | 2023-08-04 | — | — | CN | claimed |
| CN-113774390-B | Cleaning liquid for chemical mechanical polishing and preparation method thereof | 上海新阳半导体材料股份有限公司 | 2023-08-04 | — | — | CN | claimed |
| CN-113789519-A | Application of post-chemical mechanical polishing cleaning solution | 上海新阳半导体材料股份有限公司 | 2021-12-14 | — | — | CN | claimed |
| CN-113774390-A | Cleaning solution used after chemical mechanical polishing and preparation method thereof | 上海新阳半导体材料股份有限公司 | 2021-12-10 | — | — | CN | claimed |
| CN-113774392-A | Cleaning solution used after chemical mechanical polishing and preparation method thereof | 上海新阳半导体材料股份有限公司 | 2021-12-10 | — | — | CN | claimed |
| CN-113774391-A | Application of post-chemical mechanical polishing cleaning solution | 上海新阳半导体材料股份有限公司 | 2021-12-10 | — | — | CN | claimed |
| EP-0134708-B1 | PROCESS FOR PREPARING COLLOIDAL SOLUTION OF ANTIMONY PENTOXIDE | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1989-10-18 | — | — | EP | claimed |
| EP-0335195-A2 | Silica sol containing elongated-shaped particles and method for preparing the same | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1989-10-04 | — | — | EP | claimed |
| EP-0107284-B1 | PROCESS FOR THE PREPARATION OF DISPERSIONS AND GELS | UNITED KINGDOM ATOMIC ENERGY AUTHORITY (GB) | 1988-11-23 | — | — | EP | claimed |
| US-4711836-A | Development of positive-working photoresist compositions | OLIN HUNT SPECIALTY PRODUCTS, INC. (US) | 1987-12-08 | — | — | US | claimed |
| US-4589997-A | Process for preparing colloidal solution of antimony pentoxide | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1986-05-20 | — | — | US | claimed |
| US-4576921-A | Preparation of dispersions and ceramics from hydrated metal oxides | UNITED KINGDOM ATOMIC ENERGY AUTHORITY (GB) | 1986-03-18 | — | — | US | claimed |
| EP-0134708-A2 | Process for preparing colloidal solution of antimony pentoxide | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1985-03-20 | — | — | EP | claimed |
| US-4464461-A | QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPER AND A SEMICARBIZIDE STABILIZER | EASTMAN KODAK COMPANY (US) | 1984-08-07 | — | — | US | claimed |
| EP-0107284-A2 | Process for the preparation of dispersions and gels | UNITED KINGDOM ATOMIC ENERGY AUTHORITY (GB) | 1984-05-02 | — | — | EP | claimed |
| US-4294911-A | AND A QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPING AGENT | EASTMAN KODAK COMPANY (US) | 1981-10-13 | — | — | US | claimed |