Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL159368 | 0.96 | ALDH1A1 (0.42) | ALDH1A1LMNA | |
| Bromide SCHEMBL28550755 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| SCHEMBL8406832 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| Water SCHEMBL721956 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| Iodide SCHEMBL17865373 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| Hydrochloric Acid SCHEMBL1041197 | 0.92 | ALDH1A1 (0.39) | ALDH1A1LMNA | |
| SCHEMBL5044766 | 0.82 | ALDH1A1 (0.31) | ALDH1A1LMNA | |
| Sulfuric Acid SCHEMBL5039817 | 0.79 | CA5A (0.38) | ALDH1A1LMNA | |
| Fluoride Ion SCHEMBL190898 | 0.78 | — | — | |
| SCHEMBL5046885 | 0.77 | MEN1 (0.33) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1959303-B1 | CLEANING SOLUTION FOR SEMICONDUCTOR DEVICE OR DISPLAY DEVICE, AND CLEANING METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-1628336-B1 | Cleaning liquid and cleaning method | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-04 | — | — | EP | disclosed |
| US-7998914-B2 | Cleaning solution for semiconductor device or display device, and cleaning method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-08-16 | — | — | US | disclosed |
| US-20100152085-A1 | CLEANING SOLUTION FOR SEMICONDUCTOR DEVICE OR DISPLAY DEVICE, AND CLEANING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-06-17 | — | — | US | disclosed |
| US-7572758-B2 | aqueous solution of nitric acid, sulfuric acid, and specified amount of either ammonium fluoride or tetramethylammonium fluoride, and a base; for semicondutors or displays with metal wirings; removes etch residues without oxidizing or corroding the materials of copper wirings | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-08-11 | — | — | US | disclosed |
| US-20080210900-A1 | Selective Wet Etchings Of Oxides | PNC BANK, NATIONAL ASSOCIATION | 2008-09-04 | — | — | US | disclosed |
| EP-1959303-A1 | CLEANING SOLUTION FOR SEMICONDUCTOR DEVICE OR DISPLAY DEVICE, AND CLEANING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-08-20 | — | — | EP | disclosed |
| EP-1880410-A2 | SELECTIVE WET ETCHING OF OXIDES | SACHEM, INC. (US) | 2008-01-23 | — | — | EP | disclosed |
| WO-2006124201-A2 | SELECTIVE WET ETCHING OF OXIDES | SACHEM, INC. (US) | 2006-11-23 | — | — | WO | disclosed |
| US-20060040838-A1 | Cleaning liquid and cleaning method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-02-23 | — | — | US | disclosed |
| EP-1628336-A2 | Cleaning liquid and cleaning method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-02-22 | — | — | EP | disclosed |
| US-20040224866-A1 | Cleaning solution and cleaning process using the solution | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040188385-A1 | Etching agent composition for thin films having high permittivity and process for etching | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-09-30 | — | — | US | disclosed |
| US-3937806-A | WATER SOLUBLE FLUORIDE SALT AND INDIUM-MALIC ACID COMPLEX | THE PROCTER & GAMBLE COMPANY (US) | 1976-02-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100152085-A1 | CLEANING SOLUTION FOR SEMICONDUCTOR DEVICE OR DISPLAY DEVICE, AND CLEANING METHOD | SMOX, SRM, SMS | ALDH1A1 510/4885LMNA 4723/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.