Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2734642 | 0.92 | NAAA (0.39) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL30595294 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL12244967 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL30595298 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL13226047 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL6905751 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL12382052 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL755468 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL21127012 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A | |
| SCHEMBL30744 | 0.86 | NAAA (0.47) | NAAASMN1; SMN2MEN1GAAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 257 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025101801-A1 | SYSTEMS AND METHODS FOR THREE-DIMENSIONAL FABRICATION OF NANOSTRUCTURES | THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) | 2025-05-15 | — | — | WO | claimed |
| US-20240408815-A1 | PHOTORESIST COMPOSITION, SYSTEM COMPRISING A PHOTORESIST COMPOSITION, METHOD FOR PRODUCING A THREE-DIMENSIONAL STRUCTURE, AND USE OF A PHOTORESIST COMPOSITION IN 3D-PRINTING | Karlsruher Institut für Technologie (DE) | 2024-12-12 | — | — | US | claimed |
| EP-3436520-B1 | CROSSLINKABLE POLYMERIC COMPOSITIONS WITH METHYL-RADICAL SCAVENGERS AND ARTICLES MADE THEREFROM | DOW GLOBAL TECHNOLOGIES LLC (US) | 2023-10-04 | — | — | EP | claimed |
| EP-4200466-A1 | MELTBLOWN NONWOVENS HAVING HIGH VOLUME RESISTIVITY AND ARTICLES THEREOF | Dow Global Technologies LLC (US) | 2023-06-28 | — | — | EP | claimed |
| WO-2023073034-A1 | PHOTORESIST COMPOSITION, SYSTEM COMPRISING A PHOTORESIST COMPOSITION, METHOD FOR PRODUCING A THREE-DIMENSIONAL STRUCTURE, AND USE OF A PHOTORESIST COMPOSITION IN 3D-PRINTING | Karlsruher Institut für Technologie (DE) | 2023-05-04 | — | — | WO | claimed |
| EP-4173824-A1 | PHOTORESIST COMPOSITION, SYSTEM COMPRISING A PHOTORESIST COMPOSITION, METHOD FOR PRODUCING A THREE-DIMENSIONAL STRUCTURE, AND USE OF A PHOTORESIST COMPOSITION IN 3D-PRINTING | Karlsruher Institut für Technologie (DE) | 2023-05-03 | — | — | EP | claimed |
| WO-2022036672-A1 | MELTBLOWN NONWOVENS HAVING HIGH VOLUME RESISTIVITY AND ARTICLES THEREOF | DOW GLOBAL TECHNOLOGIES LLC (US) | 2022-02-24 | — | — | WO | claimed |
| JP-4764416-B2 | — | — | 2011-09-07 | — | — | JP | claimed |
| JP-2007530548-A | — | — | 2007-11-01 | — | — | JP | claimed |
| CN-1934061-A | Method for preparing hydroxystyrenes and acetylated derivatives thereof | DU PONT (US) | 2007-03-21 | — | — | CN | claimed |
| WO-2005097719-A1 | A METHOD FOR PREPARING HYDROXYSTYRENES AND ACETYLATED DERIVATIVES THEREOF | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-10-20 | — | — | WO | claimed |
| US-20050228191-A1 | Method for preparing hydroxystyrenes and acetylated derivatives thereof | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-10-13 | — | — | US | claimed |
| US-20260092190-A1 | Radiation Curable Ink Composition For Ink Jet And Recording Apparatus | SEIKO EPSON CORP (JP) | 2026-04-02 | — | — | US | disclosed |
| US-20260092189-A1 | Radiation-Curable Ink Jet Ink Composition | SEIKO EPSON CORP (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-4717739-A1 | RADIATION-CURABLE INK JET INK COMPOSITION | Seiko Epson Corporation (JP) | 2026-04-01 | — | — | EP | disclosed |
| US-20260085154-A1 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT | JSR CORPORATION (JP) | 2026-03-26 | — | — | US | disclosed |
| US-20040030203-A1 | Method of stabilizing trichloroethane during production | PPG INDUSTRIES OHIO, INC. | 2004-02-12 | — | — | US | disclosed |
| WO-2004007409-A1 | METHOD OF STABILIZING TRICHLOROETHANE DURING PRODUCTION | PPG INDUSTRIES OHIO, INC. (US) | 2004-01-22 | — | — | WO | disclosed |
| US-6040488-A | A FREE RADICAL STABILIZER HAVING AT LEAST ONE 2,2,6,6-TETRA(LOWER ALKYL)-1-PIPERIDINYLOXY-YL FREE RADICAL GROUP; STORAGE STABILITY; EFFICIENCY | PPG INDUSTRIES OHIO, INC. (US) | 2000-03-21 | — | — | US | disclosed |
| WO-1999062850-A1 | STABILIZATION OF VINYLIDENE CHLORIDE | PPG INDUSTRIES OHIO, INC. (US) | 1999-12-09 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260092190-A1 | Radiation Curable Ink Composition For Ink Jet And Recording Apparatus | KAT8, TAS2R8, NLRP3 | NAAA 3591/4885SMN1; SMN2 2067/4885MEN1 2589/4885 |
| US-20260092189-A1 | Radiation-Curable Ink Jet Ink Composition | ATM, OR10J3, TAS2R8 | NAAA 3939/4885SMN1; SMN2 1154/4885MEN1 1917/4885 |
| US-20040030203-A1 | Method of stabilizing trichloroethane during production | TTPA, CBR1, TCEA1 | NAAA 2673/4885SMN1; SMN2 1616/4885MEN1 4163/4885 |
| US-20050228191-A1 | Method for preparing hydroxystyrenes and acetylated derivatives thereof | HAAO, EP300, HACL2 | NAAA 91/4885SMN1; SMN2 4664/4885MEN1 3555/4885 |
| US-20260085154-A1 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT | RER1, COL1A1, SMC1A | NAAA 2254/4885SMN1; SMN2 457/4885MEN1 1024/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.