SCHEMBL7542387

SCHEMBL7542387

O=S(=O)(c1ccc(C(F)(F)F)cc1)C1(S(=O)(=O)c2ccc(C(F)(F)F)cc2)C=CC=CC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.40
PTGS2 P35354 4/20 0.38
PTGS1 P23219 2/20 0.38
MMP2 P08253 3/20 0.36
MMP3 P08254 3/20 0.36
MMP9 P14780 3/20 0.36
MMP8 P22894 3/20 0.36
MMP13 P45452 3/20 0.36
MMP1 P03956 3/20 0.36
MMP14 P50281 2/20 0.36
ALDH1A1 P00352 1/20 0.35
CA1 P00915 4/20 0.34
CA2 P00918 4/20 0.34
CA9 Q16790 2/20 0.34
CA12 O43570 1/20 0.34
MAPT P10636 1/20 0.34
HTR2A P28223 1/20 0.34
HTR2C P28335 1/20 0.34
RORC P51449 3/20 0.33
NR1I2 O75469 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7541828 0.78 GAA (0.44) MMP2ALDH1A1CA1CA2CA9
SCHEMBL31352972 0.68 KIF11 (0.46) KIF11PTGS2PTGS1MMP2MMP3
SCHEMBL17689396 0.66 PTGS2 (0.47) KIF11PTGS2PTGS1MMP2MMP3
SCHEMBL1666979 0.65 KIF11 (0.59) KIF11PTGS2PTGS1MMP1ALDH1A1
SCHEMBL3151057 0.65 KIF11 (0.59) KIF11PTGS2PTGS1MMP1ALDH1A1
SCHEMBL1464281 0.65 MMP2 (0.51) KIF11PTGS2PTGS1MMP2MMP3
SCHEMBL14242993 0.64 PTGS2 (0.44) KIF11PTGS2PTGS1MMP2MMP3
SCHEMBL14227518 0.64 RORC (0.47) KIF11PTGS2PTGS1ALDH1A1HTR2A
SCHEMBL1146306 0.63 KIF11 (0.57) KIF11PTGS2PTGS1MMP1ALDH1A1
SCHEMBL16140114 0.63 KIF11 (0.57) KIF11PTGS2PTGS1MMP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed