SCHEMBL7564026

SCHEMBL7564026

c1ccc(OC(Oc2ccccc2)c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 1/20 0.44
TSHR P16473 2/20 0.43
LTA4H P09960 1/20 0.43
SCN4A P35499 2/20 0.41
ADRA2A P08913 1/20 0.40
ADRA2B P18089 1/20 0.40
ADRA2C P18825 1/20 0.40
DPP4 P27487 2/20 0.39
F2 P00734 1/20 0.39
CA4 P22748 1/20 0.39
SRD5A2 P31213 1/20 0.38
CHRM1 P11229 1/20 0.37
POLB P06746 1/20 0.36
KCNA3 P22001 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2031146 0.90 SLC6A4 (0.41) SLC6A4TSHRLTA4HSCN4AADRA2A
SCHEMBL16382776 0.87 NPSR1 (0.47) SLC6A4TSHR
SCHEMBL8518703 0.85 SLC6A4 (0.39) SLC6A4TSHRLTA4HSCN4AADRA2A
SCHEMBL10942730 0.85 SLC6A4 (0.39) SLC6A4TSHRLTA4HSCN4AADRA2A
SCHEMBL2035765 0.85 CA4 (0.44) SLC6A4TSHRLTA4HSCN4AADRA2A
SCHEMBL18297906 0.85 SLC6A4 (0.39) SLC6A4TSHRLTA4HSCN4AADRA2A
SCHEMBL8309561 0.84 LTA4H (0.35) SLC6A4TSHRLTA4HSCN4AADRA2A
SCHEMBL8717190 0.84 LMNA (0.42) SLC6A4TSHRCA4
SCHEMBL18329358 0.84 LTA4H (0.52) LTA4HCA4SRD5A2
SCHEMBL16348652 0.84 SLC6A4 (0.51) SLC6A4ADRA2ASRD5A2CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5301460-A None JP disclosed
JP-5286255-A None JP disclosed
WO-2022045287-A1 THERMOSENSITIVE RECORDING MATERIAL 日本化薬株式会社 2022-03-03 WO disclosed
CN-102799087-B Toner, developer, container, image forming apparatus, image forming method, and process cartridge RICOH CO LTD 2014-08-06 CN disclosed
US-6492030-B1 SILOXANE DENATURED POLYIMIDE, DI- OR TRIALLYL COMPOUND AND DIMALEIMIDE COMPOUND; ADHERES TO METALS WITH LOW DIELECTRIC CONSTANT AND DISSIPATION FACTOR; FASTER SIGNAL PROCESSING; HIGH FREQUENCY ELECTRONICS WITH MINIATURIZED CIRCUITS TOMOEGAWA PAPER CO., LTD. (JP) 2002-12-10 US disclosed
WO-2002078970-A1 HEAT SENSITIVE RECORDING MATERIAL CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-10-10 WO disclosed
JP-H05301460-A THERMAL RECORDING MATERIAL NIKKA CHEM CO LTD 1993-11-16 JP disclosed
JP-H05286255-A THERMAL RECORDING MATERIAL NIKKA CHEM CO LTD 1993-11-02 JP disclosed