Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.32 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.32 |
| ▸ | DPP4 | P27487 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22811660 | 1.00 | NPSR1 (0.32) | NPSR1MEN1ALDH1A1HTTKMT2A | |
| SCHEMBL12170588 | 0.89 | DPP4 (0.33) | ALDH1A1DPP4 | |
| SCHEMBL22811928 | 0.88 | THRB (0.40) | NPSR1MEN1ALDH1A1HTTKMT2A | |
| SCHEMBL4109184 | 0.87 | DPP4 (0.34) | NPSR1MEN1ALDH1A1HTTKMT2A | |
| SCHEMBL737596 | 0.87 | ALDH1A1 (0.35) | NPSR1ALDH1A1DPP4 | |
| SCHEMBL17717373 | 0.86 | THRB (0.33) | NPSR1MEN1ALDH1A1HTTKMT2A | |
| SCHEMBL12153603 | 0.86 | GAA (0.33) | ALDH1A1DPP8DPP9DPP4 | |
| SCHEMBL17035932 | 0.85 | TSHR (0.43) | DPP8DPP9 | |
| SCHEMBL14330861 | 0.84 | NPSR1 (0.31) | NPSR1ALDH1A1DPP4 | |
| SCHEMBL18294129 | 0.84 | ALDH1A1 (0.32) | ALDH1A1DPP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| US-11801333-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-20230099348-A1 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-03-30 | — | — | US | disclosed |
| US-11487203-B2 | Monomers, polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2022-11-01 | — | — | US | disclosed |
| US-20090156854-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090156854-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2009-06-18 | — | — | US | disclosed |
| US-7528279-B2 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7528279-B2 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7528279-B2 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| EP-1882705-A1 | POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER | IDEMITSU KOSAN CO., LTD. (JP) | 2008-01-30 | — | — | EP | disclosed |
| US-20070129532-A1 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD (JP) | 2007-06-07 | — | — | US | disclosed |
| US-20070129532-A1 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD (JP) | 2007-06-07 | — | — | US | disclosed |
| US-20070129532-A1 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD (JP) | 2007-06-07 | — | — | US | disclosed |
| EP-1712542-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2006-10-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090156854-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | ADH1A, ADH5, TAS1R2 | NPSR1 2300/4885MEN1 1030/4885ALDH1A1 7/4885 |
| US-11487203-B2 | Monomers, polymers and photoresist compositions | MAP1LC3C, LCP1, PIN1 | NPSR1 4254/4885MEN1 2543/4885ALDH1A1 2061/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.