Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 7/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | AR | P10275 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | CASP1 | P29466 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375562 | 1.00 | ESR1 (0.48) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL6751257 | 0.84 | ESR1 (0.46) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL29370295 | 0.81 | ALDH1A1 (0.39) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL36382 | 0.81 | ALDH1A1 (0.39) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL8987443 | 0.81 | ESR1 (0.50) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL675822 | 0.79 | ESR1 (0.62) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL2673681 | 0.79 | RNASEH1 (0.42) | ESR1ALOX15ALOX12CYP2C9CYP1A2 | |
| SCHEMBL759290 | 0.78 | ESR1 (0.58) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL29375143 | 0.78 | ESR1 (0.58) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL2754945 | 0.78 | ESR1 (0.43) | ESR1ALOX15ALOX12ESR2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117106358-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-116262863-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-06-16 | — | — | CN | disclosed |
| EP-3896522-B1 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| US-7132213-B2 | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| US-20060210914-A1 | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO., LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| US-20060166131-A1 | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO, CO., LTD. (JP) | 2006-07-27 | — | — | US | disclosed |
| US-7060410-B2 | Novolak resin solution, positive photoresist composition and preparation method thereof | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-06-13 | — | — | US | disclosed |
| EP-1644426-A1 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| EP-1644427-A2 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| WO-2005007718-A1 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| WO-2005007719-A2 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| US-20040081909-A1 | Novolak resin solution, positive photoresist composition and preparation method thereof | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-04-29 | — | — | US | disclosed |
| US-6265129-B1 | FORM A RESIST PATTERN THAT HAD A MICRO-GROOVE IN EACH ELEMENT AND WHICH YET WAS SATISFACTORY IN FEATURE PROFILE AND RESOLUTION. | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-24 | — | — | US | disclosed |