Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.48 |
| ▸ | LMNA | P02545 | 3/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | ACHE | P22303 | 2/20 | 0.46 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.42 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3143792 | 1.00 | ALDH1A1 (0.48) | ALDH1A1LMNANPSR1SMN1; SMN2HTT | |
| SCHEMBL2901199 | 0.97 | MAPT (0.50) | ALDH1A1LMNANPSR1SMN1; SMN2HTT | |
| SCHEMBL450797 | 0.94 | ACHE (0.52) | ALDH1A1LMNAMAPTACHEBCHE | |
| SCHEMBL2901788 | 0.94 | ACHE (0.52) | ALDH1A1LMNAMAPTACHEBCHE | |
| SCHEMBL2964758 | 0.92 | PKM (0.48) | ALDH1A1LMNASMN1; SMN2HTTMAPT | |
| SCHEMBL1089895 | 0.92 | PKM (0.52) | ALDH1A1LMNASMN1; SMN2HTTMAPT | |
| SCHEMBL450430 | 0.91 | PKM (0.50) | ALDH1A1LMNASMN1; SMN2HTTMAPT | |
| SCHEMBL5433398 | 0.89 | HTT (0.61) | ALDH1A1LMNASMN1; SMN2HTTKDM4E | |
| SCHEMBL3144525 | 0.89 | CA12 (0.46) | ALDH1A1LMNASMN1; SMN2HTTACHE | |
| SCHEMBL2964104 | 0.89 | CA12 (0.46) | ALDH1A1LMNASMN1; SMN2HTTACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 200 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12570872-B2 | Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same | MERCK PATENT GMBH (DE) | 2026-03-10 | — | — | US | disclosed |
| WO-2024236012-A1 | POLYSILOXANE MATERIAL AND POLYSILOXANE COMPOSITION COMPRISING THE SAME | MERCK PATENT GMBH (DE) | 2024-11-21 | — | — | WO | disclosed |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| US-11899365-B2 | Photosensitive siloxane composition and pattern forming method using the same | MERCK PATENT GMBH (DE) | 2024-02-13 | — | — | US | disclosed |
| US-11866553-B2 | Polysiloxane, composition comprising the same and cured film using the same | MERCK PATENT GMBH (DE) | 2024-01-09 | — | — | US | disclosed |
| WO-2024002921-A1 | POLYSILOXANE COMPOSITION | MERCK PATENT GMBH (DE) | 2024-01-04 | — | — | WO | disclosed |
| US-11860537-B2 | Positive type photosensitive siloxane composition and cured film formed by using the same | MERCK PATENT GMBH (DE) | 2024-01-02 | — | — | US | disclosed |
| CN-114040948-B | Composition for forming gate insulating film | 默克专利有限公司 | 2023-11-17 | — | — | CN | disclosed |
| CN-113166420-B | Acrylic polymerized polysiloxane, composition containing the same, and cured film using the same | 默克专利有限公司 | 2023-06-23 | — | — | CN | disclosed |
| US-20020055059-A1 | Radiation sensitive resin composition, cathode separator and el display device | JSR CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1193557-A1 | Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| US-5925484-A | Black photosensitive resin composition, color filter made by using the same, and a process for the production thereof | TOPPAN PRINTING CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| EP-0854169-A1 | BLACK PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER MADE BY USING THE SAME, AND PROCESS FOR THE PRODUCTION THEREOF | Toppan Printing Co., Ltd. (JP) | 1998-07-22 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12570872-B2 | Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same | SMC1A, SMC2, SMC3 | ALDH1A1 283/4885LMNA 519/4885NPSR1 3062/4885 |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | FBXL19, SRSF9, CNOT9 | ALDH1A1 3931/4885LMNA 4319/4885NPSR1 3435/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.