SCHEMBL759994

SCHEMBL759994

COc1ccc(S(OS(=O)(=O)c2ccc(C)cc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.51
MAPT P10636 3/20 0.51
ALDH1A1 P00352 5/20 0.49
NPSR1 Q6W5P4 1/20 0.49
ACHE P22303 2/20 0.49
BCHE P06276 1/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
HTT P42858 2/20 0.49
NPC1 O15118 2/20 0.48
RAB9A P51151 2/20 0.48
TDP1 Q9NUW8 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
PKM P14618 1/20 0.46
TUBB4A P04350 1/20 0.44
TUBB P07437 1/20 0.44
TUBA3C P0DPH7 1/20 0.44
TUBA1B P68363 1/20 0.44
TUBA4A P68366 1/20 0.44
TUBB4B P68371 1/20 0.44
TUBB3 Q13509 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3143801 1.00 LMNA (0.51) LMNAMAPTALDH1A1NPSR1ACHE
SCHEMBL2964762 0.94 HTT (0.53) LMNAALDH1A1SMN1; SMN2HTTTDP1
SCHEMBL453521 0.94 ACHE (0.54) LMNAMAPTALDH1A1ACHEBCHE
SCHEMBL5169176 0.94 HTT (0.53) LMNAALDH1A1SMN1; SMN2HTTTDP1
SCHEMBL450431 0.94 HTT (0.53) LMNAALDH1A1SMN1; SMN2HTTTDP1
SCHEMBL2955938 0.90 VDR (0.49) LMNAALDH1A1ACHEBCHESMN1; SMN2
SCHEMBL2964106 0.90 VDR (0.49) LMNAALDH1A1ACHEBCHESMN1; SMN2
SCHEMBL64190 0.90 VDR (0.49) LMNAALDH1A1ACHEBCHESMN1; SMN2
SCHEMBL2962485 0.90 VDR (0.49) LMNAALDH1A1ACHEBCHESMN1; SMN2
SCHEMBL3144536 0.90 VDR (0.49) LMNAALDH1A1ACHEBCHESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240352203-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE ADEKA CORPORATION (JP) 2024-10-24 US disclosed
EP-4375750-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE ADEKA CORPORATION (JP) 2024-05-29 EP disclosed
CN-114040948-B Composition for forming gate insulating film 默克专利有限公司 2023-11-17 CN disclosed
CN-113166420-B Acrylic polymerized polysiloxane, composition containing the same, and cured film using the same 默克专利有限公司 2023-06-23 CN disclosed
US-11450445-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2022-09-20 US disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
US-10719013-B2 Composition for black matrix and method for producing black matrix using the same AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2020-07-21 US disclosed
EP-2774968-B1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE JNC CORP (JP) 2019-11-20 EP disclosed
US-20190204734-A1 COMPOSITION FOR BLACK MATRIX AND METHOD FOR PRODUCING BLACK MATRIX USING THE SAME AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2019-07-04 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20050031801-A1 Photo-curable fluorene derivative and composition containing the same JNC PETROCHEMICAL CORPORATION (JP) 2005-02-10 US disclosed
US-20050009982-A1 Compound having silsesquioxane skeleton and its polymer CHISSO CORPORATION (JP) 2005-01-13 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed
EP-0594452-B1 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-01-15 EP disclosed
US-5432039-A Radiation sensitive quinone diazide and resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-07-11 US disclosed
EP-0594452-A2 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-04-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240352203-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE FBXL19, SRSF9, CNOT9 LMNA 4319/4885MAPT 2568/4885ALDH1A1 3931/4885
US-20050009982-A1 Compound having silsesquioxane skeleton and its polymer C1S, H1-4, H1-0 LMNA 280/4885MAPT 3028/4885ALDH1A1 1780/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.