SCHEMBL7603497

SCHEMBL7603497

O=[N+]([O-])c1cccc([N+](=O)[O-])c1COS(=O)(=O)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.45
ALDH1A1 P00352 3/20 0.39
TDP1 Q9NUW8 3/20 0.39
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
GPR35 Q9HC97 2/20 0.38
S100A4 P26447 2/20 0.38
CA1 P00915 1/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
RECQL P46063 2/20 0.37
MAPT P10636 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
PTPN1 P18031 1/20 0.35
AR P10275 1/20 0.35
LMNA P02545 1/20 0.35
MAPK1 P28482 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
TSHR P16473 1/20 0.35
PTPRC P08575 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1534226 0.83 ALDH1A1 (0.48) CA2ALDH1A1KMT2AMEN1TSHR
SCHEMBL13113207 0.82 CA2 (0.35) CA2TDP1KMT2AMEN1GPR35
SCHEMBL13098341 0.81 TDP1 (0.41) CA2ALDH1A1TDP1KMT2AMEN1
SCHEMBL28290110 0.79 TDP1 (0.46) ALDH1A1TDP1KMT2AMEN1GPR35
SCHEMBL5711756 0.79 TDP1 (0.46) ALDH1A1TDP1KMT2AMEN1GPR35
SCHEMBL3253710 0.79 PTGS2 (0.42) KMT2AMEN1NPC1RAB9AMAPT
SCHEMBL6581375 0.79 CA2 (0.40) CA2ALDH1A1TDP1CA1RECQL
SCHEMBL952171 0.78 KMT2A (0.49) ALDH1A1TDP1KMT2AMEN1GPR35
SCHEMBL14620752 0.78 TDP1 (0.39) CA2ALDH1A1TDP1KMT2AMEN1
SCHEMBL5135097 0.77 HTT (0.49) ALDH1A1KMT2AMEN1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US claimed
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
US-20170309363-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2017-10-26 US disclosed
CN-1245664-C Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORP (JP) 2006-03-15 CN disclosed
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-6274289-B1 Chemical resist thickness reduction process ADVANCED MICRO DEVICES, INC. 2001-08-14 US disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed