Potassium Ion

Potassium Ion

SCHEMBL7626089

C=CC(=O)NC(C(C)C)S(=O)(=O)[O-].[K+]

nearest known ligand 0.50

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.50
TGM2 P21980 1/20 0.34
CYP2C19 P33261 1/20 0.32
ALDH1A1 P00352 1/20 0.30
MAPK1 P28482 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1775597 0.96 TSHR (0.50) TSHRTGM2CYP2C19ALDH1A1MAPK1
Lithium Ion SCHEMBL30776952 0.96 TSHR (0.50) TSHRTGM2CYP2C19ALDH1A1MAPK1
SCHEMBL31441111 0.96 TSHR (0.50) TSHRTGM2CYP2C19ALDH1A1MAPK1
Acrylamide SCHEMBL812219 0.90 TSHR (0.44) TSHRTGM2ALDH1A1
SCHEMBL162366 0.81 TSHR (0.54) TSHRTGM2CYP2C19ALDH1A1MAPK1
Potassium Ion SCHEMBL3657892 0.81 TSHR (0.54) TSHRTGM2CYP2C19ALDH1A1MAPK1
SCHEMBL1775598 0.79 TSHR (0.52) TSHRTGM2CYP2C19ALDH1A1MAPK1
Ammonia Solution, Strong SCHEMBL7618985 0.79 TSHR (0.52) TSHRTGM2CYP2C19ALDH1A1MAPK1
Lithium SCHEMBL38660899 0.79 TSHR (0.52) TSHRTGM2CYP2C19ALDH1A1MAPK1
SCHEMBL27967446 0.79 TSHR (0.52) TSHRTGM2CYP2C19ALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6440856-B1 GOOD FOR CHEMICAL MECHANICAL POLISHING ABRASIVE PARTICLES SUCH AS SILICA AND ALUMINA; POLYMER OR COPOLYMER HAVING AT LEAST ONE GROUP SELECTED FROM THE GROUP CONSISTING OF SULFONIC ACID AND CARBOXYLIC ACID JSR CORPORATION (JP) 2002-08-27 US disclosed