Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRD5A2 | P31213 | 6/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | DAO | P14920 | 1/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.50 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | RXRA | P19793 | 2/20 | 0.46 |
| ▸ | RXRB | P28702 | 2/20 | 0.46 |
| ▸ | RXRG | P48443 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.44 |
| ▸ | KIF11 | P52732 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.44 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10558699 | 1.00 | SRD5A2 (0.55) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL11358313 | 0.94 | SRD5A2 (0.61) | SRD5A2TSHRCES2CES1TP53 | |
| SCHEMBL9719919 | 0.90 | SRD5A2 (0.57) | SRD5A2TSHRHPGDEPHX2 | |
| SCHEMBL9008980 | 0.90 | SRD5A2 (0.58) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL9290961 | 0.84 | SRD5A2 (0.55) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL694095 | 0.83 | SRD5A2 (0.59) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL9009108 | 0.83 | SRD5A2 (0.54) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL18275136 | 0.82 | SRD5A2 (0.53) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL6546858 | 0.81 | SRD5A2 (0.52) | SRD5A2TSHRDAONAPRTCES2 | |
| SCHEMBL160204 | 0.80 | TSHR (0.58) | TSHRCES1PTPN1KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4866155-A | HEAT, RADIATION RESISTANCE; TRANSPARENCY | HOECHST CELANESE CORPORATION (US) | 1989-09-12 | — | — | US | claimed |
| EP-0323561-A2 | Polyesters of bis (2-(4-hydroxyphenyl) hexafluoroisopropyl)- diphenyl ether | HOECHST CELANESE CORPORATION (US) | 1989-07-12 | — | — | EP | claimed |
| EP-0317944-A2 | Polymers prepared from 4,4'-bis-(2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | claimed |
| US-11608316-B2 | Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-03-21 | — | — | US | disclosed |
| US-11414382-B2 | Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20210002216-A1 | Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2021-01-07 | — | — | US | disclosed |
| US-20200392079-A1 | Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2020-12-17 | — | — | US | disclosed |
| US-20180370908-A1 | NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2018-12-27 | — | — | US | disclosed |
| US-8778596-B2 | Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8697332-B2 | Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20130309607-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-4914180-A | Polyamides prepared from 2-(3-aminophenyl)-2-(4-aminophenyl) hexafluoro propane | HOECHST CELANESE CORPORATION (US) | 1990-04-03 | — | — | US | disclosed |
| US-4866155-A | HEAT, RADIATION RESISTANCE; TRANSPARENCY | HOECHST CELANESE CORPORATION (US) | 1989-09-12 | — | — | US | disclosed |
| EP-0323561-A2 | Polyesters of bis (2-(4-hydroxyphenyl) hexafluoroisopropyl)- diphenyl ether | HOECHST CELANESE CORPORATION (US) | 1989-07-12 | — | — | EP | disclosed |
| US-4845183-A | MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | disclosed |
| EP-0317944-A2 | Polymers prepared from 4,4'-bis-(2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | disclosed |
| EP-0317940-A2 | Polycarbonamides of bis (2-(4-carboxyphenyl)hexafluoroisopropyl) - diphenyl ether | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | disclosed |
| EP-0317942-A2 | Heat resistant polyamides and polybenzoxazoles from bis-[(aminohydroxyphenyl hexafluoro-isopropyl] diphenyl ethers | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | disclosed |
| US-4822868-A | Polycarbonamide of bis(2-(4-carboxyphenyl)-hexafluoroisopropyl)diphenyl ether | HOECHST CELANESE CORPORATION (US) | 1989-04-18 | — | — | US | disclosed |
| EP-0264678-A1 | Polyamides with hexafluoroisopropylidene groups, positively acting photosensitive compositions, and recording materials using them | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11414382-B2 | Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator | RAD51, RER1, REV1 | SRD5A2 2421/4885TSHR 2333/4885DAO 1023/4885 |
| US-20210002216-A1 | Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator | RAD51, RER1, REV1 | SRD5A2 2421/4885TSHR 2333/4885DAO 1023/4885 |
| US-11608316-B2 | Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator | RAD51, RER1, TAS1R1 | SRD5A2 2336/4885TSHR 2101/4885DAO 1459/4885 |
| US-20180370908-A1 | NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR | RAD51, ASIC1, SUN2 | SRD5A2 3321/4885TSHR 4379/4885DAO 1409/4885 |
| US-20200392079-A1 | Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator | RAD51, RER1, TAS1R1 | SRD5A2 2336/4885TSHR 2101/4885DAO 1459/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.