Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA5A | P35218 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7702718 | 0.91 | GPR3 (0.35) | GPR3CA1CA2CA5ACA9 | |
| SCHEMBL7708749 | 0.91 | GPR3 (0.35) | GPR3CA1CA2CA5ACA9 | |
| SCHEMBL7711392 | 0.89 | MMP13 (0.33) | HPGD | |
| SCHEMBL7702806 | 0.89 | HSD11B1 (0.38) | PTPN1CA1CA2 | |
| SCHEMBL7702865 | 0.87 | PTPN1 (0.30) | PTPN1 | |
| SCHEMBL5872604 | 0.86 | GPR3 (0.36) | GPR3PTPN1CA1CA2CA5A | |
| SCHEMBL7708838 | 0.85 | CYTH2 (0.35) | LMNAHPGDHTT | |
| SCHEMBL7708812 | 0.85 | ALDH1A1 (0.34) | CA1CA2CA5ACA9 | |
| SCHEMBL7708622 | 0.84 | ESR1 (0.35) | CA1CA2CA9LMNA | |
| SCHEMBL7702833 | 0.84 | AGER (0.36) | GPR3CA1CA2CA5ACA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | claimed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| EP-0710885-B1 | Radiation sensitive composition | CLARIANT FINANCE BVI LTD (VG) | 1998-12-30 | — | — | EP | disclosed |
| US-5738972-A | BLEND OF BINDER, DISSOLUTION INHIBITOR, PHOTOSENSITIVR COMPOUND, BASE, PHENOLIC RESIN AND SOLVENT | HOECHST JAPAN LIMITED (JP) | 1998-04-14 | — | — | US | disclosed |
| EP-0756203-A1 | Radiation-sensitive composition | HOECHST INDUSTRY LIMITED (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0710885-A1 | Radiation sensitive composition | HOECHST JAPAN LIMITED (JP) | 1996-05-08 | — | — | EP | disclosed |
| WO-1992015549-A1 | UNSATURATED POLYMERS AND RADIATION-SENSITIVE MIXTURE MADE THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-17 | — | — | WO | disclosed |