Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S100A4 | P26447 | 2/20 | 0.40 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.37 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.37 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.37 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.37 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.37 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.37 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.37 |
| ▸ | GPR35 | Q9HC97 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25355025 | 0.95 | S100A4 (0.38) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL8086823 | 0.87 | S100A4 (0.39) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL28378850 | 0.86 | ALDH1A1 (0.38) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL9027310 | 0.84 | GRIN2D (0.42) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL27718348 | 0.84 | GPR35 (0.36) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL10566686 | 0.84 | GPR35 (0.36) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL26343938 | 0.84 | S100A4 (0.40) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL1200400 | 0.83 | VCP (0.40) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL9559667 | 0.81 | CA1 (0.36) | S100A4GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL6232592 | 0.80 | VCP (0.39) | S100A4GPR35 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102030616-A | Preparation method for 2,3,5,6-tetrafluorohydroquinone | SHANGHAI HETENG FINE CHEMICAL CO LTD | 2011-04-27 | — | — | CN | claimed |
| US-5998662-A | O-amino (thio) phenolcarboxylic acids and their preparation | SIEMENS AKTIENGESELLSCHAFT (DE) | 1999-12-07 | — | — | US | claimed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| EP-4056627-B1 | POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSTION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-08-23 | — | — | EP | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20220289911-A1 | POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-15 | — | — | US | disclosed |
| EP-4056627-A1 | POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSTION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-09-14 | — | — | EP | disclosed |
| CN-115044040-A | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2022-09-13 | — | — | CN | disclosed |
| EP-0905170-B1 | Polybenzoxazoles and polybenzothiazoles precursors | QIMONDA AG (DE) | 2013-10-30 | — | — | EP | disclosed |
| CN-102030616-A | Preparation method for 2,3,5,6-tetrafluorohydroquinone | SHANGHAI HETENG FINE CHEMICAL CO LTD | 2011-04-27 | — | — | CN | disclosed |
| US-5998662-A | O-amino (thio) phenolcarboxylic acids and their preparation | SIEMENS AKTIENGESELLSCHAFT (DE) | 1999-12-07 | — | — | US | disclosed |
| EP-0905124-A1 | o-amino(thio)phenol-carboxylic acids and their preparation | SIEMENS AKTIENGESELLSCHAFT (DE) | 1999-03-31 | — | — | EP | disclosed |
| EP-0905170-A2 | Polybenzoxazoles and polybenzothiazoles precursors | SIEMENS AKTIENGESELLSCHAFT (DE) | 1999-03-31 | — | — | EP | disclosed |
| US-5849934-A | Method for preparing aromatic compounds | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1998-12-15 | — | — | US | disclosed |
| US-5750731-A | POLYIMIDE ANHYDRIDE MONOMERS | NIPPON TELEGRAPH & TELEPHONE CORPORATION (JP) | 1998-05-12 | — | — | US | disclosed |
| EP-0480266-B1 | Perfluorinated polyimide, perfluorinated poly(amic acid), starting compounds therefor, and methods for preparing them | NIPPON TELEGRAPH & TELEPHONE (JP) | 1996-06-26 | — | — | EP | disclosed |
| US-5449741-A | Electronics with impact strength | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5233018-A | Heat resistance and low optical transmission loss in the near-infrared region; integrated circuits | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1993-08-03 | — | — | US | disclosed |
| EP-0480266-A2 | Perfluorinated polyimide, perfluorinated poly(amic acid), starting compounds therefor, and methods for preparing them | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1992-04-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | S100A4 1208/4885GRIN2D 169/4885GRIN3B 1795/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.