Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.43 |
| ▸ | KMO | O15229 | 1/20 | 0.36 |
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.36 |
| ▸ | CTSS | P25774 | 2/20 | 0.32 |
| ▸ | CTSK | P43235 | 2/20 | 0.32 |
| ▸ | PDE2A | O00408 | 1/20 | 0.32 |
| ▸ | ROCK2 | O75116 | 1/20 | 0.31 |
| ▸ | PTPN5 | P54829 | 2/20 | 0.30 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375107 | 0.78 | ACMSD (0.49) | HDAC4HDAC2HDAC8KMOACMSD | |
| SCHEMBL760436 | 0.78 | ACMSD (0.49) | HDAC4HDAC2HDAC8KMOACMSD | |
| SCHEMBL29558450 | 0.77 | GABRA1 (0.36) | HDAC4HDAC2HDAC8ACMSD | |
| SCHEMBL28717708 | 0.77 | GABRA1 (0.36) | HDAC4HDAC2HDAC8ACMSD | |
| SCHEMBL2312929 | 0.76 | HDAC4 (0.43) | HDAC4HDAC2HDAC8KMOACMSD | |
| SCHEMBL7804682 | 0.74 | NUDT1 (0.37) | HDAC4HDAC2HDAC8PTPN5PTPN2 | |
| SCHEMBL7804684 | 0.71 | NUDT1 (0.39) | HDAC4HDAC2HDAC8 | |
| SCHEMBL9135740 | 0.70 | GABRA1 (0.34) | HDAC4HDAC2HDAC8PTPN5PTPN2 | |
| SCHEMBL9138960 | 0.70 | GABRA1 (0.34) | HDAC4HDAC2HDAC8PTPN5PTPN2 | |
| SCHEMBL2530090 | 0.70 | HDAC4 (0.39) | HDAC4HDAC2HDAC8KMO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6316170-B2 | COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-11-13 | — | — | US | disclosed |
| US-20010006767-A1 | Developing solution and method of forming polyimide pattern by using the developing solution | YOSHIAKI KAWAMONZEN | 2001-07-05 | — | — | US | disclosed |