Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 1/20 | 0.39 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.39 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.39 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.37 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.33 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | PPIA | P62937 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9244494 | 0.95 | HDAC4 (0.42) | HDAC4HDAC2HDAC8GABRA1GABRB2 | |
| SCHEMBL29558450 | 0.83 | GABRA1 (0.36) | HDAC4HDAC2HDAC8GABRA1GABRB2 | |
| SCHEMBL28717708 | 0.83 | GABRA1 (0.36) | HDAC4HDAC2HDAC8GABRA1GABRB2 | |
| SCHEMBL29484423 | 0.81 | PTPN5 (0.39) | HDAC4HDAC2HDAC8GABRA1GABRB2 | |
| SCHEMBL2514437 | 0.81 | PTPN5 (0.39) | HDAC4HDAC2HDAC8GABRA1GABRB2 | |
| SCHEMBL6004412 | 0.80 | HDAC4 (0.50) | HDAC4HDAC2HDAC8ALDH1A1HPGD | |
| SCHEMBL7531576 | 0.80 | HDAC4 (0.50) | HDAC4HDAC2HDAC8ALDH1A1HPGD | |
| SCHEMBL5275279 | 0.79 | HDAC4 (0.38) | HDAC4HDAC2HDAC8GABRA1GABRB2 | |
| SCHEMBL3169205 | 0.78 | HDAC4 (0.52) | HDAC4HDAC2HDAC8ALDH1A1HPGD | |
| SCHEMBL7721762 | 0.78 | HDAC4 (0.37) | HDAC4HDAC2HDAC8GABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022239597-A1 | RESIN CONTAINING PHENOLIC HYDROXYL GROUP | DIC株式会社 | 2022-11-17 | — | — | WO | disclosed |
| US-11254778-B2 | Novolak resins and resist materials | DIC CORPORATION (JP) | 2022-02-22 | — | — | US | disclosed |
| EP-2639636-B1 | POSITIVE-TYPE PHOTORESIST COMPOSITION | DAINIPPON INK & CHEMICALS (JP) | 2021-05-19 | — | — | EP | disclosed |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | DIC CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| US-10466590-B2 | Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating | DIC CORPORATION (JP) | 2019-11-05 | — | — | US | disclosed |
| US-10414850-B2 | Resin containing phenolic hydroxyl groups, and resist film | DIC CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| US-20190169348-A1 | NOVOLAK RESINS AND RESIST MATERIALS | DIC CORPORATION (JP) | 2019-06-06 | — | — | US | disclosed |
| US-10266471-B2 | Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition | DIC CORPORATION (JP) | 2019-04-23 | — | — | US | disclosed |
| US-20190077901-A1 | NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM | DIC CORPORATION (JP) | 2019-03-14 | — | — | US | disclosed |
| US-10179828-B2 | Curable composition for permanent resist films, and permanent resist film | DIC CORPORATION (JP) | 2019-01-15 | — | — | US | disclosed |
| US-8623585-B2 | Positive-type photoresist composition | DIC CORPORATION (JP) | 2014-01-07 | — | — | US | disclosed |
| EP-2653922-A1 | POSITIVE PHOTORESIST COMPOSITION, COATING FILM THEREOF, AND NOVOLAC PHENOL RESIN | DIC Corporation (JP) | 2013-10-23 | — | — | EP | disclosed |
| US-20130244174-A1 | POSITIVE-TYPE PHOTORESIST COMPOSITION | DIC CORPORATION (JP) | 2013-09-19 | — | — | US | disclosed |
| EP-2639636-A1 | POSITIVE-TYPE PHOTORESIST COMPOSITION | DIC Corporation (JP) | 2013-09-18 | — | — | EP | disclosed |
| EP-2639637-A1 | POSITIVE-TYPE PHOTORESIST COMPOSITION | DIC Corporation (JP) | 2013-09-18 | — | — | EP | disclosed |
| US-20130224655-A1 | POSITIVE-TYPE PHOTORESIST COMPOSITION | DIC CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-8034529-B2 | Photosensitive resin composition and photosensitive element | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20090214979-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| US-6641972-B2 | Mixture of alakli solubile phenolic resin, another resin and quinonediazido compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-11-04 | — | — | US | disclosed |
| US-20030059706-A1 | Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same | TOKYO OHKA KOGYO CO., LTD. | 2003-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10466590-B2 | Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating | CSNK1A1L, NCKAP1L, CALR | HDAC4 2357/4885HDAC2 521/4885HDAC8 823/4885 |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | HACL2, ASH2L, HEATR1 | HDAC4 1375/4885HDAC2 1661/4885HDAC8 1679/4885 |
| US-10266471-B2 | Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition | CALU, ARL1, AHR | HDAC4 1434/4885HDAC2 1030/4885HDAC8 864/4885 |
| US-10179828-B2 | Curable composition for permanent resist films, and permanent resist film | ASH2L, DNMT3L, H1-0 | HDAC4 892/4885HDAC2 387/4885HDAC8 1208/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.