Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.36 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.36 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.36 |
| ▸ | KCNQ5 | Q9NR82 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 3/20 | 0.33 |
| ▸ | RAB9A | P51151 | 3/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | GFER | P55789 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15935804 | 0.79 | MEN1 (0.35) | POLBMEN1KMT2AMAPK1 | |
| SCHEMBL13668773 | 0.79 | POLB (0.44) | POLBKCNQ3KCNQ2KCNQ4KCNQ5 | |
| SCHEMBL85684 | 0.79 | POLB (0.44) | POLBKCNQ3KCNQ2KCNQ4KCNQ5 | |
| SCHEMBL785885 | 0.77 | — | — | |
| SCHEMBL12645061 | 0.75 | — | — | |
| SCHEMBL112450 | 0.74 | MEN1 (0.31) | MEN1KMT2AMAPK1 | |
| SCHEMBL27686586 | 0.74 | POLB (0.34) | POLB | |
| SCHEMBL12149823 | 0.74 | KMT2A (0.35) | POLBHSD11B1MEN1KMT2AALDH1A1 | |
| SCHEMBL1105067 | 0.74 | POLB (0.44) | POLBKCNQ3KCNQ2KCNQ4KCNQ5 | |
| SCHEMBL1414754 | 0.73 | POLB (0.42) | POLBKCNQ3KCNQ2KCNQ4KCNQ5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-9546133-B2 | Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-01-17 | — | — | US | disclosed |
| US-20160023992-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | MARUZEN PETROCHEMICAL CO., LTD. | 2016-01-28 | — | — | US | disclosed |
| US-9216948-B2 | Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2015-12-22 | — | — | US | disclosed |
| CN-102781911-B | Latent acids and their use | BASF SE | 2015-07-22 | — | — | CN | disclosed |
| US-8859180-B2 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859180-B2 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| CN-102186815-B | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2014-07-30 | — | — | CN | disclosed |
| CN-101952269-B | Sulphonium salt initiators | BASF SE | 2014-06-25 | — | — | CN | disclosed |
| US-8759462-B2 | Method for producing resist copolymer having low molecular weight | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-06-24 | — | — | US | disclosed |
| CN-101353319-A | Salt for acid forming agent and chemical amplifying type positive resist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2009-01-28 | — | — | CN | disclosed |
| CN-101258184-A | Star polymer and process for producing the same | NIPPON SODA CO (JP) | 2008-09-03 | — | — | CN | disclosed |
| CN-101168509-A | Polyatomic phenol compound and chemical amplification type photoresist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2008-04-30 | — | — | CN | disclosed |
| CN-101130510-A | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2008-02-27 | — | — | CN | disclosed |
| CN-101125823-A | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2008-02-20 | — | — | CN | disclosed |
| CN-101121679-A | Salt adapted for acid generating agent and chemical enlargement type positive corrosion-resisting agent composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2008-02-13 | — | — | CN | disclosed |
| CN-100354257-C | Sulfonate and a resist composition | SUMITOMO CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| CN-1576272-A | Sulfonate and a resist composition | SUMITOMO CHEMICAL CO (JP) | 2005-02-09 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160023992-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | ORAI1, STOM, SORT1 | POLB 60/4885KCNQ3 1469/4885KCNQ2 802/4885 |
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | HAAO, HPD, IL4 | POLB 1617/4885KCNQ3 3437/4885KCNQ2 3397/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.