Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 16/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 16/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 9/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 9/20 | 0.32 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.32 |
| ▸ | F2R | P25116 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL785945 | 0.82 | MEN1 (0.33) | CHRM2CHRM1CHRM4CHRM3CHRM5 | |
| SCHEMBL10291119 | 0.77 | CHRM2 (0.38) | CHRM2CHRM1CHRM4CHRM3CHRM5 | |
| SCHEMBL13596541 | 0.74 | KDM4E (0.41) | — | |
| SCHEMBL16229112 | 0.71 | MEN1 (0.32) | CHRM2CHRM1CHRM4CHRM3CHRM5 | |
| SCHEMBL14048435 | 0.68 | — | — | |
| SCHEMBL9640386 | 0.68 | SMN1; SMN2 (0.40) | CHRM2CHRM1CHRM4CHRM3CHRM5 | |
| SCHEMBL9640383 | 0.68 | SMN1; SMN2 (0.40) | CHRM2CHRM1CHRM4CHRM3CHRM5 | |
| SCHEMBL46066 | 0.68 | — | — | |
| SCHEMBL901114 | 0.67 | — | — | |
| SCHEMBL13135723 | 0.67 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859180-B2 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859180-B2 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8455596-B2 | Method for producing a copolymer for photoresist | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-06-04 | — | — | US | disclosed |
| US-8455596-B2 | Method for producing a copolymer for photoresist | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-06-04 | — | — | US | disclosed |
| US-8377625-B2 | Method for producing a copolymer solution with a uniform concentration for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8211615-B2 | Copolymer for immersion lithography and compositions | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-8067516-B2 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100143842-A1 | METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20100062371-A1 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100047710-A1 | COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090306328-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2009-12-10 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | FRG1, H1-10, POLL | CHRM2 1107/4885CHRM1 1141/4885CHRM4 3065/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.