SCHEMBL7903612

SCHEMBL7903612

CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.COc1ccc(S(=O)(=O)[O-])cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.48
MAPT P10636 1/20 0.45
PKM P14618 2/20 0.44
ALDH1A1 P00352 4/20 0.44
LMNA P02545 2/20 0.44
ALOX15 P16050 1/20 0.44
APEX1 P27695 1/20 0.44
MAPK1 P28482 1/20 0.44
RECQL P46063 1/20 0.44
HSD17B10 Q99714 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
TP53 P04637 1/20 0.43
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
CA9 Q16790 1/20 0.42
HTT P42858 1/20 0.42
MMP13 P45452 2/20 0.40
MEN1 O00255 1/20 0.40
NPC1 O15118 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8131241 0.89 ALDH1A1 (0.52) HSD11B1MAPTALDH1A1LMNAALOX15
SCHEMBL30445249 0.85 MAPT (0.53) HSD11B1MAPTALDH1A1LMNAALOX15
SCHEMBL7739929 0.85 NR3C2 (0.44) HSD11B1MAPTPKMALDH1A1LMNA
SCHEMBL8629251 0.83 HSD11B1 (0.49) HSD11B1MAPTPKMALDH1A1LMNA
SCHEMBL244141 0.83 ACHE (0.50) MAPTPKMALDH1A1LMNATP53
SCHEMBL51290 0.83 TSHR (0.50) HSD11B1MAPTALDH1A1LMNAALOX15
SCHEMBL11146525 0.83 ACHE (0.50) MAPTPKMALDH1A1LMNATP53
SCHEMBL452774 0.83 ALDH1A1 (0.46) HSD11B1MAPTALDH1A1LMNARECQL
SCHEMBL217706 0.82 ALDH1A1 (0.48) HSD11B1MAPTALDH1A1LMNAALOX15
SCHEMBL2904028 0.82 AHR (0.44) HSD11B1MAPTPKMALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6200480-B1 CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES ARCH SPECIALTY CHEMICALS, INC. 2001-03-13 US disclosed
EP-1054715-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS Olin Microelectronic Chemicals, Inc. (US) 2000-11-29 EP disclosed
WO-1999036151-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-07-22 WO disclosed
EP-0848288-A1 Resist materials LUCENT TECHNOLOGIES INC. (US) 1998-06-17 EP disclosed