SCHEMBL7976225

SCHEMBL7976225

Cc1ccc(S(=O)(=O)OCCCC(OS(=O)(=O)c2ccc(C)cc2)C(=O)Oc2ccccc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.39
CYP24A1 Q07973 1/20 0.38
ALDH1A1 P00352 1/20 0.37
STAT3 P40763 1/20 0.37
HTT P42858 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
PTGES O14684 1/20 0.37
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
GAA P10253 1/20 0.36
PSMD10 O75832 1/20 0.36
LMNA P02545 1/20 0.36
DHODH Q02127 1/20 0.35
RECQL P46063 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7976100 0.97 CYP24A1 (0.37) TDP1CYP24A1ALDH1A1STAT3HTT
SCHEMBL7060903 0.93 HTT (0.39) ALDH1A1STAT3HTTSMN1; SMN2PTGES
SCHEMBL7973159 0.92 MAPT (0.39) TDP1SMN1; SMN2PTGES
SCHEMBL7959874 0.88 MAPT (0.39) TDP1SMN1; SMN2PTGES
SCHEMBL7975992 0.85 LMNA (0.47) LMNA
SCHEMBL7959891 0.84 KMT2A (0.46) TDP1ALDH1A1STAT3SMN1; SMN2KMT2A
SCHEMBL7959885 0.84 PSMD10 (0.43) ALDH1A1STAT3KMT2AMEN1GAA
SCHEMBL7971248 0.84 FKBP1A (0.41) CYP24A1ALDH1A1PTGESKMT2AMEN1
SCHEMBL7065836 0.84 MAPT (0.41) TDP1SMN1; SMN2PTGES
SCHEMBL7973217 0.82 PSMD10 (0.38) CYP24A1ALDH1A1STAT3KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6172234-B1 Optically active cyclic amino acid ester derivatives and processes for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-01-09 US disclosed
EP-0976729-A1 Optically active cyclic amino acid ester derivatives and processes for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-02-02 EP disclosed