SCHEMBL8046960

SCHEMBL8046960

Cc1ccc(C)c(S(=O)(=O)c2ccc(OC(C)C)c(S(=O)(=O)c3cc(C)ccc3C)c2)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.43
UBE2N P61088 1/20 0.39
FFAR4 Q5NUL3 1/20 0.38
POLB P06746 2/20 0.36
MAPT P10636 2/20 0.36
MEN1 O00255 1/20 0.36
TP53 P04637 1/20 0.36
LMNA P02545 2/20 0.36
ALDH1A1 P00352 5/20 0.35
HPGD P15428 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
CYP2C19 P33261 1/20 0.35
CNR2 P34972 1/20 0.35
TSHR P16473 1/20 0.35
MAPK1 P28482 1/20 0.35
GAA P10253 2/20 0.35
PKM P14618 1/20 0.35
USP2 O75604 1/20 0.35
KDM4E B2RXH2 1/20 0.35
F2 P00734 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8429001 0.91 ALDH1A1 (0.45) KMT2APOLBMAPTLMNAALDH1A1
SCHEMBL8058766 0.85 GAA (0.50) KMT2AFFAR4POLBMAPTMEN1
SCHEMBL8047043 0.84 KMT2A (0.56) KMT2AFFAR4POLBMAPTMEN1
SCHEMBL8062009 0.84 KMT2A (0.50) KMT2APOLBMEN1TP53LMNA
SCHEMBL8427164 0.82 KMT2A (0.41) KMT2AUBE2NPOLBMAPTMEN1
SCHEMBL8061986 0.77 HTR6 (0.46) KMT2APOLBMAPTMEN1ALDH1A1
SCHEMBL12180748 0.76 CA1 (0.44) KMT2APOLBMEN1LMNASMN1; SMN2
SCHEMBL8064293 0.75 ALDH1A1 (0.48) KMT2APOLBMAPTMEN1LMNA
SCHEMBL11127859 0.75 GAA (0.60) KMT2AUBE2NMAPTMEN1ALDH1A1
SCHEMBL6211399 0.75 GAA (0.60) KMT2AUBE2NPOLBMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed