SCHEMBL8058766

SCHEMBL8058766

Cc1ccc(S(=O)(=O)c2ccc(OC(C)C)c(S(=O)(=O)c3ccc(C)cc3)c2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.50
KMT2A Q03164 4/20 0.44
MAPT P10636 4/20 0.44
MEN1 O00255 3/20 0.44
POLB P06746 2/20 0.42
TSHR P16473 1/20 0.42
MAPK1 P28482 1/20 0.42
HTT P42858 3/20 0.41
CNR1 P21554 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
RAPGEF4 Q8WZA2 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ALDH1A1 P00352 4/20 0.40
USP2 O75604 1/20 0.40
FFAR4 Q5NUL3 1/20 0.38
CA2 P00918 2/20 0.38
KDM4E B2RXH2 2/20 0.38
NPSR1 Q6W5P4 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8061986 0.88 HTR6 (0.46) KMT2AMAPTMEN1POLBTSHR
SCHEMBL8064293 0.86 ALDH1A1 (0.48) KMT2AMAPTMEN1POLBTSHR
SCHEMBL8047043 0.86 KMT2A (0.56) GAAKMT2AMAPTMEN1POLB
SCHEMBL8046960 0.85 KMT2A (0.43) GAAKMT2AMAPTMEN1POLB
SCHEMBL8429001 0.83 ALDH1A1 (0.45) KMT2AMAPTPOLBTSHRHTT
SCHEMBL8064330 0.82 TSHR (0.59) GAAKMT2AMAPTMEN1POLB
SCHEMBL8061999 0.75 ABCB1 (0.47) MAPTPOLBTSHRMAPK1CNR1
SCHEMBL8492991 0.74 RAPGEF4 (0.47) GAAKMT2AMAPTPOLBTSHR
SCHEMBL12180748 0.73 CA1 (0.44) GAAKMT2AMEN1POLBTSHR
SCHEMBL29469841 0.72 CA1 (0.47) GAAKMT2AMAPTMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed