SCHEMBL8064320

SCHEMBL8064320

COc1ccc(S(=O)(=O)c2ccc(C)c(C)c2)cc1S(=O)(=O)c1ccc(C)c(C)c1

nearest known ligand 0.58

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.58
MAPK1 P28482 2/20 0.58
POLB P06746 1/20 0.58
KMT2A Q03164 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.53
ALDH1A1 P00352 3/20 0.50
PKM P14618 2/20 0.50
GAA P10253 1/20 0.50
TP53 P04637 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
LMNA P02545 3/20 0.46
TDP1 Q9NUW8 1/20 0.46
HTT P42858 1/20 0.46
HTR6 P50406 1/20 0.45
MAPT P10636 1/20 0.43
TUBB1 Q9H4B7 1/20 0.41
FFAR4 Q5NUL3 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9914234 0.88 TSHR (0.63) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL8064330 0.85 TSHR (0.59) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL8062009 0.83 KMT2A (0.50) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL8047043 0.83 KMT2A (0.56) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL15071602 0.82 TSHR (0.70) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL8046997 0.81 HTR6 (0.69) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL12834487 0.81 TSHR (0.54) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL47890 0.80 LMNA (0.67) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL15460389 0.78 LMNA (0.64) TSHRMAPK1POLBKMT2ASMN1; SMN2
SCHEMBL12341790 0.76 PKM (0.53) TSHRMAPK1POLBKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed