SCHEMBL807575

SCHEMBL807575

CC(C)(C)c1ccc(C(C)(C)S)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.55
LMNA P02545 1/20 0.52
TYR P14679 1/20 0.52
KIF11 P52732 2/20 0.44
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
ALDH1A1 P00352 5/20 0.42
HPGD P15428 2/20 0.41
MAPT P10636 1/20 0.41
MAPK1 P28482 1/20 0.41
HDAC1 Q13547 1/20 0.41
SLC22A2 O15244 1/20 0.41
SLC22A1 O15245 1/20 0.41
SLC22A3 O75751 1/20 0.41
BCHE P06276 3/20 0.40
ACHE P22303 3/20 0.40
ALOX15 P16050 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
SRD5A2 P31213 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19401160 0.92 KIF11 (0.56) TSHRLMNATYRKIF11NPC1
SCHEMBL22931120 0.92 TSHR (0.48) TSHRLMNATYRKIF11NPC1
SCHEMBL424728 0.83 TSHR (0.73) TSHRLMNATYRKIF11NPC1
SCHEMBL3918056 0.79 TSHR (0.60) TSHRLMNAKIF11NPC1RAB9A
SCHEMBL8182318 0.77 MEN1 (0.56) TSHRLMNANPC1RAB9AMAPK1
SCHEMBL7358338 0.77 ACHE (0.41) NPC1RAB9AALDH1A1MAPTMAPK1
SCHEMBL20940482 0.77 ESR1 (0.62) TSHRLMNATYRKIF11NPC1
SCHEMBL20435296 0.77 ALDH1A1 (0.48) TSHRKIF11NPC1RAB9AALDH1A1
SCHEMBL21566844 0.77 ALDH1A1 (0.46) TSHRKIF11ALDH1A1
SCHEMBL8589504 0.77 CYP2A6 (0.44) TSHRNPC1RAB9AALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-11914300-B2 Manufacturing method of semiconductor chip, and kit FUJIFILM CORPORATION (JP) 2024-02-27 US disclosed
US-11693321-B2 Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-04 US disclosed
US-20220121123-A1 METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2022-04-21 US disclosed
US-11256173-B2 Treatment liquid for manufacturing semiconductor and pattern forming method FUJIFILM CORPORATION (JP) 2022-02-22 US disclosed
US-11175585-B2 Treatment liquid and treatment liquid housing body FUJIFILM CORPORATION (JP) 2021-11-16 US disclosed
US-20210188808-A1 COMPOUNDS AS NEURONAL HISTAMINE RECEPTOR-3 ANTAGONISTS AND USES THEREOF XWPharma Ltd. (KY) 2021-06-24 US disclosed
US-20210157241-A1 MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT FUJIFILM CORPORATION (JP) 2021-05-27 US disclosed
US-10890847-B2 Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2021-01-12 US disclosed
US-20190025702-A1 TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2019-01-24 US disclosed
EP-2763200-A1 THERMOELECTRIC CONVERSION MATERIAL AND THERMOELECTRIC CONVERSION ELEMENT FUJI-FILM Corporation (JP) 2014-08-06 EP disclosed
US-20140072905-A1 POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
EP-2693444-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE FILM USING CONDUCIVE COMPOSITION, AND METHOD FOR MANUFACTURING CONDUCTIVE FILM FUJIFILM Corporation (JP) 2014-02-05 EP disclosed
US-20130045445-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-02-21 US disclosed
US-8343708-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
WO-2012036315-A1 METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-03-22 WO disclosed
WO-2012026622-A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2012-03-01 WO disclosed
EP-1367440-B1 Positive-working resist composition FUJIFILM CORP (JP) 2011-09-21 EP disclosed
WO-2011102546-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2011-08-25 WO disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210188808-A1 COMPOUNDS AS NEURONAL HISTAMINE RECEPTOR-3 ANTAGONISTS AND USES THEREOF HRH3, HRH4, HRH2 TSHR 338/4885LMNA 4217/4885TYR 662/4885
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device RER1, COL1A1, RAD51 TSHR 3144/4885LMNA 143/4885TYR 4110/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.